2016
DOI: 10.1088/1742-6596/700/1/012022
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Fabrication of hybrid thin film structures from HTS and CMR materials

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Cited by 2 publications
(3 citation statements)
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“…• (see for example [2]). The temperature dependences of the resistance (R vs. T dependence) of the strips and of the interface in the crossing area were measured using a DC four probe method and analyzed in terms of the interaction of the HTS and FM layers.…”
Section: Methodsmentioning
confidence: 99%
“…• (see for example [2]). The temperature dependences of the resistance (R vs. T dependence) of the strips and of the interface in the crossing area were measured using a DC four probe method and analyzed in terms of the interaction of the HTS and FM layers.…”
Section: Methodsmentioning
confidence: 99%
“…First, a 25-40-nm-thick LSMO film was deposited on a MgO single-crystal substrate. The as-prepared ferromagnetic LSMO thin film was patterned as a base electrode of a junction using standard photolithography processes and etched by a solution of potassium iodide, hydrochloric and ascorbic acid [11]. Subsequently, a superconducting YBCO thin film with a thickness of about 50-70 nm was prepared on the MgO substrate with patterned LSMO.…”
Section: Methodsmentioning
confidence: 99%
“…Subsequently, a superconducting YBCO thin film with a thickness of about 50-70 nm was prepared on the MgO substrate with patterned LSMO. Then, standard photolithography processes and wet etching (0.1 % solution of nitric acid) were used to pattern the YBCO as a counter electrode [11]. A schematic view of the sample with three junctions of different areas on one chip is shown in the inset of figure 1.…”
Section: Methodsmentioning
confidence: 99%