Fabrication of Large-Area Patterned Nanostructures for Optical Applications by Nanoskiving

Xu, Qiaobing; Bao, Jinxiao; Rioux, Robert M.; Perez‐Castillejos, Raquel; Capasso, Federico; Whitesides, George M.

doi:10.1021/nl0713979

Cited by 87 publications

(116 citation statements)

References 31 publications

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“…64 The selfassembly of the thin-film epoxy slabs is a route to the fabrication of large-area patterned arrays. 53,65 Fabrication of Complex Nanostructures Using Topographically Patterned Substrates as a Template. Sectioning Perpendicular to the Plane of the Surface.…”

Section: Resultsmentioning

confidence: 99%

“…The mid-IR transmission spectrum of the array of U-shaped nanostructures had three resonant peaks (5.1, 6.5, and 14.5 m); we attribute these resonances to first-order and harmonic resonant plasmon modes induced by the unpolarized incident infrared light. 53 The transmission spectrum of a single epoxy slab (100-nm thickness) containing periodic parallel lines had no resonant peaks, and the transmission decreased continuously in the 4 -16 m region. This behavior is typical of a mid-IR wire-grid polarizer.…”

Section: Stacking Of the Thin Epoxy Sectionsmentioning

confidence: 99%

“…These optical characteristics are consistent with our recent experimental results describing the behavior of arrays of U-shaped nanostructures irradiated by polarized IR light. 53 In this case, we inserted a commercial wire-grid polarizer in the path of the unpolarized incident mid-IR light in order to generate light with a single polarization.…”

Section: Stacking Of the Thin Epoxy Sectionsmentioning

confidence: 99%

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Fabrication of Complex Metallic Nanostructures by Nanoskiving

Rioux

Whitesides

2007

ACS Nano

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T his article describes several routes to fabricate complex metallic nanostructures by nanoskiving. The origin of the term "nanoskiving" is in the word "skiving" (a procedure used to cut thin slices from a thicker bulk material). 1 Nanoskiving combines deposition of thin films of metal on an epoxy substrate, with sectioning of an epoxy block (containing the thin metal films) using an ultramicrotome. It is experimentally simple and requires little in the way of facilities (for example, access to a cleanroom or a high-resolution e-beam writer is unnecessary). It is applicable to many classes of structures and materials with which conventional methods of nanofabrication (e.g., EUV or X-ray photolithography, e-beam lithography (EBL), focused ionbeam (FIB)) fail. The technique described in this paper has the ability both to generate "master" structures (that is, it does not require the nanostructures to be written in a separate step using a technique such as e-beam writing or FIB) and to "manufacture" (that is to make hundreds of copies of a nanostructure). It thus provides a new capability to nanofabrication. In this technique, we embed thin (20 -100 nm) metal structures in an epoxy substrate and section the resulting structure into thin (50 -1000 nm) slabs in a plane perpendicular (or parallel) to the thin metal film using an ultramicrotome ( Figure 1). The thickness of the deposited metal film and the thickness of the sections cut by the ultramicrotome determine the cross-section of the metal structures in these epoxy sections.Conventional top-down techniques to generate nanoscale structures and nanostructured materials include photolithography 2-5 and scanning-beam lithography (e.g., electron beam and FIB lithography). 6-9 Although these techniques are useful, versatile, and highly developed, they also have limitations: high capital and operating costs, limited availability of the facilities required to use them, an inability to fabricate structures on nonplanar surfaces, and restrictions on the classes of materials that can be fabricated with them caused by concerns for cross-contamination (especially in microelectronics fabrication). An additional limitation of the scanning-beam methods is that they are serial. Fabrication of three-dimensional (3D) nanostructures still remains a challenge and often requires complicated techniques such as multiphoton absorption lithography; this technique is a serial process and is limited to minimal feature sizes of 100 nm. 10 Nanoscience and nanotechnology would benefit from new, low-cost techniques to fabricate electrically and optically functional structures with

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Section: Resultsmentioning

confidence: 99%

Section: Stacking Of the Thin Epoxy Sectionsmentioning

confidence: 99%

Section: Stacking Of the Thin Epoxy Sectionsmentioning

confidence: 99%

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Fabrication of Complex Metallic Nanostructures by Nanoskiving

Rioux

Whitesides

2007

ACS Nano

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“…One of the most promising uses of nanoskiving is the fabrication and replication of 2D arrays of nanostructures embedded in thin slabs, which can be transferred to another substrate (52), for optics or other applications (5). Figure 3 summarizes the procedure used (53).…”

Section: Fabrication Of 2d Arrays Of Rings and Crescentsmentioning

confidence: 99%

Survey of Materials for Nanoskiving and Influence of the Cutting Process on the Nanostructures Produced

Lipomi

Martínez

Rioux

et al. 2010

ACS Appl. Mater. Interfaces

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This paper examines the factors that influence the quality of nanostructures fabricated by sectioning thin films with an ultramicrotome ("nanoskiving"). It surveys different materials (metals, ceramics, semiconductors, and conjugated polymers), deposition techniques (evaporation, sputter deposition, electroless deposition, chemical-vapor deposition, solution-phase synthesis, and spincoating), and geometries (nanowires or two-dimensional arrays of rings and crescents). It then correlates the extent of fragmentation of the nanostructures with the composition of the thin films, the methods used to deposit them, and the parameters used for sectioning. There are four major conclusions. (i) Films of soft and compliant metals (those that have bulk values of hardness less than or equal to those of palladium, or e500 MPa) tend to remain intact upon sectioning, whereas hard and stiff metals (those that have values of hardness greater than or equal to those of platinum, or g500 MPa) tend to fragment. (ii) All conjugated polymers tested form intact nanostructures. (iii) The extent of fragmentation is lowest when the direction of cutting is perpendicular to the exposed edge of the embedded film. (iv) The speed of cutting-from 0.1 to 8 mm/s-has no effect on the frequency of defects. Defects generated during sectioning include scoring from defects in the knife, delamination of the film from the matrix, and compression of the matrix. The materials tested were: aluminum, titanium, nickel, copper, palladium, silver, platinum, gold, lead, bismuth, germanium, silicon dioxide (SiO 2 ), alumina (Al 2 O 3 ), tin-doped indium oxide (ITO), lead sulfide nanocrystals, the semiconducting polymers poly(2-methoxy-5-(2′-ethyl-hexyloxy)-1,4-phenylene vinylene) (MEH-PPV), poly(3-hexylthiophene) (P3HT), and poly(benzimidazobenzophenanthroline ladder) (BBL), and the conductive polymer poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS).

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“…In previous work, Xu et al fabricated arrays of open and closed-loop structures of gold using a process that combined photolithography, replica molding, and nanoskiving. 34 These arrays served as mid-IR, frequencyselective surfaces. The structures had relatively large outer diameters (2 m) and were sectioned from an embedded structure with relatively shallow relief (ϳ2 m); this topography did not allow a large number of cross sections to be made.…”

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confidence: 99%

Fabrication and Replication of Arrays of Single- or Multicomponent Nanostructures by Replica Molding and Mechanical Sectioning

Lipomi¹,

Kats

Kim

et al. 2010

ACS Nano

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. § These authors contributed equally to this work.T he interaction of electromagnetic fields with metallic nanostructures can produce collective oscillations of the conduction electrons at metalϪdielectric interfaces. These oscillations are known as localized surface plasmon resonances (LSPRs) and propagating surface plasmon polaritons (SPPs) and are responsible for most of the phenomena in the field of plasmonics. 1 Two-and threedimensional arrays of metallic nanostructures could play key roles in functional materials. Optical filters, 2,3 substrates for optical detection of chemical and biological analytes using LSPRs 4 or surface-enhanced Raman scattering (SERS), 5Ϫ7 substrates for enhanced luminosity, 8 materials to augment absorption in thin-film photovoltaic devices, 9,10 metamaterials 11,12 with negative magnetic permeabilities 13 and negative refractive indices, 14 and surfaces for perfect lenses 15 and invisibility cloaking 16 are examples of possible and realized applications. There are, however, significant technical challenges in generating arbitrary patterns of metallic, dielectric, and semiconducting nanostructures for research and for potential commercial devices. The most sophisticated patterns are fabricated using electron-beam lithography (EBL), 17 focusedion beam (FIB) milling and lithography, 14 or direct laser writing. 18 These techniques can generate nearly arbitrary patterns in resists (e.g., EBL) or hard materials (e.g., FIB milling), but they are serial, expensive, and require access to a cleanroom.A number of techniques have emerged that have begun to address the challenges associated with conventional scanningbeam lithographic tools. 19 Xia and coworkers recently reviewed synthetic methods that can produce large quantities of high-quality metallic structures for plasmonic applications. 20 These materials, however, are difficult to arrange in the ordered arrays that are required for many applications in optics. 21 Van Duyne and co-workers have developed an approach to generate ordered arrays of metallic particles called "nanosphere lithography", which uses a monolayer of colloidal crystals as a stencil mask; the triangular voids direct the deposition of metal on the substrate by evaporation. 22 Giessen and co-workers used the same voids as apertures through which to produce split-ring resonators by rotating the substrate at an angle during evaporation. 23 The laboratories of Rogers, Odom, Nuzzo, and others have used soft lithographic processes to fabricate large-area patterns of metallic nanostructures.

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Fabrication of Large-Area Patterned Nanostructures for Optical Applications by Nanoskiving

Cited by 87 publications

References 31 publications

Fabrication of Complex Metallic Nanostructures by Nanoskiving

Fabrication of Complex Metallic Nanostructures by Nanoskiving

Survey of Materials for Nanoskiving and Influence of the Cutting Process on the Nanostructures Produced

Fabrication and Replication of Arrays of Single- or Multicomponent Nanostructures by Replica Molding and Mechanical Sectioning

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