2005
DOI: 10.1109/ted.2005.851811
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Fabrication of Large-Scaled Organic Light Emitting Devices on the Flexible Substrates Using Low-Pressure Imprinting Lithography

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Cited by 29 publications
(19 citation statements)
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“…Although NIL-based approaches have proven excellent resolutions, there are still significant challenges in meeting the stringent requirements of semiconductor IC manufacturing, especially in terms of defect control and production-level throughput, which requires printing 60-80 wafers per hour with extremely high yields. On the other hand, because of its simplicity this technique has found numerous applications in electronics (e.g., hybrid plastic electronics, [17] organic electronics and photonics, [18,19] nanoelectronic devices in Si [20,21] and in GaAs [22] ), in photonics (e.g., organic lasers, [23] conjugated [24] and nonlinear optical polymer nanostructures, [25] highresolution organic light-emitting diode (OLED) pixels, [26,27] diffractive optical elements, [28] broadband polarizers [29][30][31] ), in magnetic devices (e.g., single-domain magnetic structures, [32,33] high-density patterned magnetic media and highcapacity disks, [34,35,36] ), in nanoscale control of polymer crystallization, [37] and in biological applications (e.g., manipulating…”
Section: Introductionmentioning
confidence: 99%
“…Although NIL-based approaches have proven excellent resolutions, there are still significant challenges in meeting the stringent requirements of semiconductor IC manufacturing, especially in terms of defect control and production-level throughput, which requires printing 60-80 wafers per hour with extremely high yields. On the other hand, because of its simplicity this technique has found numerous applications in electronics (e.g., hybrid plastic electronics, [17] organic electronics and photonics, [18,19] nanoelectronic devices in Si [20,21] and in GaAs [22] ), in photonics (e.g., organic lasers, [23] conjugated [24] and nonlinear optical polymer nanostructures, [25] highresolution organic light-emitting diode (OLED) pixels, [26,27] diffractive optical elements, [28] broadband polarizers [29][30][31] ), in magnetic devices (e.g., single-domain magnetic structures, [32,33] high-density patterned magnetic media and highcapacity disks, [34,35,36] ), in nanoscale control of polymer crystallization, [37] and in biological applications (e.g., manipulating…”
Section: Introductionmentioning
confidence: 99%
“…NIL is a scalable technique, and can be adapted to high throughput roll-to-roll processing. The versatility of the NIL has made it an attractive strategy for a wide range of applications such as organic electronics, [2] photonics, [3] magnetic devices [4] and biological applications [5] .…”
mentioning
confidence: 99%
“…Patterning with NIL is relatively easy, fast, and inexpensive, due to the simple process. High-resolution patterns with resolu- tions of less than 10 nm can be transferred using this technique [8] and numerous electrical and optical devices have been fabricated [9][10][11][12][13]. Refinements of the basic NIL procedure have resulted in a number of different process variants [4].…”
Section: Introductionmentioning
confidence: 99%