“…Although NIL-based approaches have proven excellent resolutions, there are still significant challenges in meeting the stringent requirements of semiconductor IC manufacturing, especially in terms of defect control and production-level throughput, which requires printing 60-80 wafers per hour with extremely high yields. On the other hand, because of its simplicity this technique has found numerous applications in electronics (e.g., hybrid plastic electronics, [17] organic electronics and photonics, [18,19] nanoelectronic devices in Si [20,21] and in GaAs [22] ), in photonics (e.g., organic lasers, [23] conjugated [24] and nonlinear optical polymer nanostructures, [25] highresolution organic light-emitting diode (OLED) pixels, [26,27] diffractive optical elements, [28] broadband polarizers [29][30][31] ), in magnetic devices (e.g., single-domain magnetic structures, [32,33] high-density patterned magnetic media and highcapacity disks, [34,35,36] ), in nanoscale control of polymer crystallization, [37] and in biological applications (e.g., manipulating…”