Fabrication of metal nanoring array by nanoimprint lithography (NIL) and reactive ion etching

Cui, Bo; Veres, Teodor

doi:10.1016/j.mee.2007.01.158

Cited by 42 publications

(23 citation statements)

References 18 publications

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“…It can achieve the desired result because SiO 2 etching using CF 4 gas is highly anisotropic, leading to negligible etch of the SiO 2 surrounding the Cr “disk” on the substrate. Otherwise, a more isotropic etching chemistry using SF 6 gas would result in a ring-shaped pattern surrounding the Cr “disk” [10]. …”

Section: Discussionmentioning

confidence: 99%

Mold Fabrication for 3D Dual Damascene Imprinting

Rahman

Cui

2010

Nanoscale Res Lett

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Previously, a damascene process based on nanoimprint lithography has been proposed (Schmid G M, et al. in J Vac Sci Technol B 24(3) 1283, 2006) to greatly reduce the fabrication steps of metal interconnection in integrated circuit. For such a process to become a viable technique, a mold having two pattern levels with precise alignment between them must be fabricated first. To this end, this work demonstrates a “self-aligned” fabrication process where the two pattern levels would be perfectly aligned if ignoring the noise during e-beam writing. The process is based on one EBL on a bi-layer resist stack, with the sensitivity for the top layer much higher than that of the bottom layer, which enables separate pattern transfer of the two pattern levels. Using ZEP-520A and poly(dimethylglutarimide) (PMGI) resists, we fabricated pillars having a diameter of 150 nm sitting on ridges having a width of 1.5 μm, which can be used to create via-holes and trenches for IC interconnect by nanoimprint lithography. The current process can also find applications in other areas that require two-level patterning with precise alignment between them.

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Section: Discussionmentioning

confidence: 99%

Mold Fabrication for 3D Dual Damascene Imprinting

Rahman

Cui

2010

Nanoscale Res Lett

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“…For example, circular concentric gratings have been demonstrated with different periods and line-widths. In previous study, nanoring arrays [10], circular metallic gratings with a minimum line-width of 80 nm were obtained [11]. Moreover, because the lift-off patterns are largely determined by the imprinted resist layer, the property of the resist layer would affect the final patterns.…”

Section: Nil Involving Lift-off Processmentioning

confidence: 99%

Nanoimprint technology for patterning functional materials and its applications

Chen

2015

Microelectronic Engineering

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“…NIL has been used to fabricate metamaterials [56][57][58][59][60] and planar periodic arrays of nanoparticles, including arrays of nanospheres. 17,[54][55][61][62][63][64][65][66][67][68][69][70][71][72] This technique presents low cost, high throughput and high resolution, and it can be adopted for areas fabrication of about 1 cm 2 . 53…”

Section: Nanoimprint Lithographymentioning

confidence: 99%

Linear and Planar Periodic Arrays of Metallic Nanospheres: Fabrication, Optical Properties and Applications

Campione

Capolino

2011

Selected Topics in Photonic Crystals and Metamaterials

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This chapter describes electromagnetic properties of 1D-and 2D-periodic arrays of metallic nanospheres that support plasmonic modes. Current fabrication possibilities are reported, and a simple formulation to analyze array electromagnetic properties is summarized. We review these properties, provide information about mode propagation in the array plane, and we analyze transmissivity, reflectivity and absorption when the array is illuminated by a plane wave, as well as the extinction cross section. Last, we summarize possible applications of arrays of plasmonic nanoparticles.

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Fabrication of metal nanoring array by nanoimprint lithography (NIL) and reactive ion etching

Cited by 42 publications

References 18 publications

Mold Fabrication for 3D Dual Damascene Imprinting

Mold Fabrication for 3D Dual Damascene Imprinting

Nanoimprint technology for patterning functional materials and its applications

Linear and Planar Periodic Arrays of Metallic Nanospheres: Fabrication, Optical Properties and Applications

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