2007
DOI: 10.1016/j.mee.2007.01.256
|View full text |Cite
|
Sign up to set email alerts
|

Fabrication of metallic nanostructures for investigating plasmon-induced field enhancement

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
25
0

Year Published

2008
2008
2024
2024

Publication Types

Select...
6
3

Relationship

0
9

Authors

Journals

citations
Cited by 35 publications
(25 citation statements)
references
References 4 publications
0
25
0
Order By: Relevance
“…It is important to stress that to this end we would consider a device integrating a large number of nanocones, a scenario already demonstrated in previous reports. [40,48] The actual response of the device would be controlled by illumination parameters such as polarization and angle (e.g., tilted illumination) and by the device material and geometrical characteristics such as the spatial arrangement of the nanocones (e.g., randomly or perfectly aligned nanocone arrays). In this regard, we go one step further to anticipate that the effect of tilting the incoming illumination ( Figure S7, Supporting Information) is of strong importance in assuring an individual response of the nanocone in promoting nanoscale temperature gradients.…”
Section: Resultsmentioning
confidence: 99%
“…It is important to stress that to this end we would consider a device integrating a large number of nanocones, a scenario already demonstrated in previous reports. [40,48] The actual response of the device would be controlled by illumination parameters such as polarization and angle (e.g., tilted illumination) and by the device material and geometrical characteristics such as the spatial arrangement of the nanocones (e.g., randomly or perfectly aligned nanocone arrays). In this regard, we go one step further to anticipate that the effect of tilting the incoming illumination ( Figure S7, Supporting Information) is of strong importance in assuring an individual response of the nanocone in promoting nanoscale temperature gradients.…”
Section: Resultsmentioning
confidence: 99%
“…[36][37][38][39] The (25 μm) 2 arrays of gold nanocones with different distances between the cones used in this study are fabricated by applying electron beam lithography using PMMA (polymethyl methacrylate) for the preparation of Al 2 O 3 etch masks by a lift-off process. The fabrication processes developed by the authors are based on the transfer of circular etch masks into a gold layer by argon ion milling, during which the conical shape of the nanostructures is formed.…”
Section: Methodsmentioning
confidence: 99%
“…Dry etching of metal films through a nanostructured mask is fundamentally similar to focused ion beam milling, yet it is a much faster process. With the dry etching, large areas of nanocones can be produced on planar or even non-planar surfaces [10,18,[23][24][25][26][27][28][29][30]. The third fabrication strategy is based on the self-formation of nanocones inside cylindrical nanowell templates during the deposition of the respective metal, making use of an effect which is known as aperture clogging or self-shading [15,23,31,32].…”
Section: Introductionmentioning
confidence: 99%