Fabrication of millimeter-long structures in sapphire using femtosecond infrared laser pulses and selective etching

Capuano, Luigi; Tiggelaar, Roald M.; Berenschot, Johan W.; Gardeniers, Han; Römer, G.R.B.E.

doi:10.1016/j.optlaseng.2020.106114

Cited by 24 publications

(19 citation statements)

References 33 publications

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“…When focused laser beam modifies crystalline sapphire modified region becomes amorphous [ 143 ]. Then, amorphous and porous regions are etched out in aggressive etchants like concentrated (40–50%) HF at room temperature [ 140 , 141 , 142 , 144 , 145 , 146 ] or around 35% KOH solution heated to 85–100 °C temperature [ 147 ]. Even more exotic etchant choices were demonstrated—sapphire was etched in phosphoric and sulfuric acid mixture at 300 °C temperature [ 148 , 149 ].…”

Section: Fabrication Of Functional 3d Structuresmentioning

confidence: 99%

3D Manufacturing of Glass Microstructures Using Femtosecond Laser

Butkutė

Jonušauskas

2021

Micromachines

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The rapid expansion of femtosecond (fs) laser technology brought previously unavailable capabilities to laser material processing. One of the areas which benefited the most due to these advances was the 3D processing of transparent dielectrics, namely glasses and crystals. This review is dedicated to overviewing the significant advances in the field. First, the underlying physical mechanism of material interaction with ultrashort pulses is discussed, highlighting how it can be exploited for volumetric, high-precision 3D processing. Next, three distinct transparent material modification types are introduced, fundamental differences between them are explained, possible applications are highlighted. It is shown that, due to the flexibility of fs pulse fabrication, an array of structures can be produced, starting with nanophotonic elements like integrated waveguides and photonic crystals, ending with a cm-scale microfluidic system with micro-precision integrated elements. Possible limitations to each processing regime as well as how these could be overcome are discussed. Further directions for the field development are highlighted, taking into account how it could synergize with other fs-laser-based manufacturing techniques.

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Section: Fabrication Of Functional 3d Structuresmentioning

confidence: 99%

3D Manufacturing of Glass Microstructures Using Femtosecond Laser

Butkutė

Jonušauskas

2021

Micromachines

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“…It was shown that in fused silica, the light polarization determines the orientation of the nanaogratings, which affects the etching rate significantly [34]. A similar tendency of nanogratings orientation depending on light polarization has been demonstrated in crystalline sapphire samples, as well [35]. Thus, in single-line experiments, linear polarization perpendicular to the scanning direction was used to maintain a high etching rate.…”

Section: Methodsmentioning

confidence: 84%

Sapphire Selective Laser Etching Dependence on Radiation Wavelength and Etchant

Butkutė¹,

Sirutkaitis²,

Gailevičius³

et al. 2022

Preprint

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Transparent and high-hardness materials have become the object of wide interest. Most notably, it concerns technical glasses and crystals. A notable example is a sapphire – one of the most rigid materials having impressive mechanical stability and good optical properties. Nonetheless, using this material for 3D micro-fabrication is not straightforward due to its brittle nature. On the microscale, selective laser etching (SLE) technology is an appropriate approach for such media. Therefore, we present our research on c-cut crystalline sapphire microprocessing by using femtosecond radiation-induced SLE. Here we demonstrate a comparison between different wavelength radiation (1030 nm, 515 nm, 343 nm) usage for modification inscription and various etchants (Hydrofloridic acid, Sodium Hydroxide, Potassium Hydroxide and Sulphuric and Phosphoric acid mixture) comparison. We show that regular SLE etchants such as Hydrofluoric acid or Potassium Hydroxide are unsuitable materials for selective sapphire laser etching. Meanwhile, a 78% sulphuric and 22% phosphoric acid mixture at 270°C temperature is a good alternative for this process. We present the changes in the material after the separate processing steps. Finally, a protocol for advanced sapphire structure formation and a few exemplary structures are presented.

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“…When focused laser beam modifies crystalline sapphire modified region becomes amorphous [143]. Then, amorphous and porous regions are etched out in aggressive etchants like concentrated (40-50%) HF at room temperature [140][141][142][144][145][146] or around 35% KOH solution heated to 85-100 • C temperature [147]. Even more exotic etchant choices were demonstrated-sapphire was etched in phosphoric and sulfuric acid mixture at 300 • C temperature [148,149].…”

Section: Selective Laser Etching (Sle)mentioning

confidence: 99%

New Trends and Applications in Femtosecond Laser Micromachining

2022

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Fabrication of millimeter-long structures in sapphire using femtosecond infrared laser pulses and selective etching

Cited by 24 publications

References 33 publications

3D Manufacturing of Glass Microstructures Using Femtosecond Laser

3D Manufacturing of Glass Microstructures Using Femtosecond Laser

Sapphire Selective Laser Etching Dependence on Radiation Wavelength and Etchant

New Trends and Applications in Femtosecond Laser Micromachining

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