2008
DOI: 10.1016/j.catcom.2007.07.035
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Fabrication of N-doped TiO2 thin films by laser ablation method: Mechanism of N-doping and evaluation of the thin films

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Cited by 33 publications
(15 citation statements)
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“…Anatase to rutile transformation was accelerated in the presence of N 2 O as a nitrogen source [44]. When N 2 gas was used to dope N into TiO 2 , higher visible light efficiency was achieved at low pressures of N 2 [50] and in the presence of ammonia [51]. The decomposition of molecular nitrogen into atomic N was accelerated by both ammonia and low pressure of N 2 .…”
Section: Nitrogen Dopingmentioning
confidence: 97%
See 1 more Smart Citation
“…Anatase to rutile transformation was accelerated in the presence of N 2 O as a nitrogen source [44]. When N 2 gas was used to dope N into TiO 2 , higher visible light efficiency was achieved at low pressures of N 2 [50] and in the presence of ammonia [51]. The decomposition of molecular nitrogen into atomic N was accelerated by both ammonia and low pressure of N 2 .…”
Section: Nitrogen Dopingmentioning
confidence: 97%
“…The decomposition of molecular nitrogen into atomic N was accelerated by both ammonia and low pressure of N 2 . Atomic nitrogen N can be more easily incorporated in titania lattice leading to higher N content in the titania samples [50,51].…”
Section: Nitrogen Dopingmentioning
confidence: 98%
“…spray pyrolysis [15], sol-gel method [16], atmospheric pressure chemical vapor deposition [17], ion-assisted electron beam evaporation [18], atomic layer deposition [19] and sputtering [20,21]. The synthesis of these films by pulsed laser deposition (PLD) was also studied by several groups in the last decade [22][23][24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39]. Nitrogen containing titanium-oxide films can easily be made by PLD via varying the experimental conditions, most importantly by ablating different targets (Ti [22][23][24], TiO [24], TiO 2 [24][25][26][27][28][29][30][31][32][33], TiN [24,34], pre-mixed (TiO 2 + TiN) [35,36] and TiNO [37]) in a variety of atmospheres (N 2 [25][26]<...>…”
Section: N-doped Tio 2 Thin Films Have Been Prepared By Various Deposmentioning
confidence: 99%
“…Various deposition techniques were used to deposit TiO 2 thin films with reported photocatalytic activity such as sol‐gel, laser ablation, spray pyrolysis, APCVD, magnetron sputtering, electron‐beam evaporation, and atomic layer deposition (ALD) . Among these techniques, APCVD has garnered a greater interest as it can be incorporated into the commercial process for float glass production.…”
Section: Introductionmentioning
confidence: 99%