Fabrication of nano/micro dual-periodic structures by multi-beam evanescent wave interference lithography using spatial beats

Masui, Shuzo; Torii, Y.; Michihata, Masaki; Takamasu, Kiyoshi; Takahashi, Satoru

doi:10.1364/oe.27.031522

Cited by 11 publications

(2 citation statements)

References 24 publications

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“…The dual-periodic diffraction grating used was fabricated using photolithography. For detailed fabrication methods, refer to references [ 32 , 33 ]. Here is an overview of the fabrication process.…”

Section: Methodsmentioning

confidence: 99%

Longitudinal Mode Number Estimation of External Cavity Diode Laser Using Dual Periodic Grating for Optical Profiler System

Michihata,

Goda,

Masui

et al. 2024

Sensors

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The concept of an optical profiler based on optical resonance was proposed, highlighting the initial requirements for mode number estimation. We proposed a method for estimating the longitudinal mode number of a laser propagating in an external cavity diode laser with high accuracy, utilizing dual-periodic diffraction gratings. These gratings were fabricated using interference lithography. To estimate the mode number, the wavelengths of two different modes are compared. Therefore, the greater the difference between the wavelengths, the higher the accuracy of the mode number determination. While the mode number difference was approximately 35 when using a conventional diffraction grating, this could be increased by a factor of 20 to around 700 using the dual-periodic grating. The relative accuracy achieved was 1.4 × 10−5.

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Section: Methodsmentioning

confidence: 99%

Longitudinal Mode Number Estimation of External Cavity Diode Laser Using Dual Periodic Grating for Optical Profiler System

Michihata,

Goda,

Masui

et al. 2024

Sensors

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“…Near-field technology [12] has been investigated to overcome the diffraction limit for nanofabrication processes. Evanescent-wave interference lithography [13] is a low-cost process for fabricating nanoscale structures. However, the optical intensity in the recording medium of this process is highly attenuated owing to the exponential decay of the evanescent waves.…”

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confidence: 99%

Theoretical investigation of two-dimensional sub-wavelength structures fabricated by multi-beam surface plasmon interference lithography

Wang¹,

Jia²,

Ren³

et al. 2021

EPL

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In this study, multi-beam surface plasmon (SP) interference lithography was theoretically proposed and demonstrated to fabricate periodic two-dimensional sub-wavelength structures. The lithography structures were based on an attenuated total reflection prism used to excite the SPs using a 442 nm laser. Circular lattices with periods of 166 and 288 nm were successfully obtained via three- and six-beam SP interference lithography, respectively; these lattices exhibited an identical feature size of 96 nm. Square dot arrays with a 177 nm period and 88.5 nm spot size were obtained by four-beam SP interference lithography. The proposed lithography technology has a simple structure and is economical; further, it may provide an effective method for the fabrication of two-dimensional sub-wavelength structures.

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Laser Interference Lithography for Fabrication of Planar Scale Gratings for Optical Metrology

Shimizu

2021

Nanomanuf Metrol

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Laser interference lithography is an attractive method for the fabrication of a large-area two-dimensional planar scale grating, which can be employed as a scale for multi-axis optical encoders or a diffractive optical element in many types of optical sensors. Especially, optical configurations such as Lloyd’s mirror interferometer based on the division of wavefront method can generate interference fringe fields for the patterning of grating pattern structures at a single exposure in a stable manner. For the fabrication of a two-dimensional scale grating to be used in a planar/surface encoder, an orthogonal two-axis Lloyd’s mirror interferometer, which has been realized through innovation to Lloyd’s mirror interferometer, has been developed. In addition, the concept of the patterning of the two-dimensional orthogonal pattern structure at a single exposure has been extended to the non-orthogonal two-axis Lloyd’s mirror interferometer. Furthermore, the optical setup for the non-orthogonal two-axis Lloyd’s mirror interferometer has been optimized for the fabrication of a large-area scale grating. In this review article, principles of generating interference fringe fields for the fabrication of a scale grating based on the interference lithography are reviewed, while focusing on the fabrication of a two-dimensional scale grating for planar/surface encoders. Verification of the pitch of the fabricated pattern structures, whose accuracy strongly affects the performance of planar/surface encoders, is also an important task to be addressed. In this paper, major methods for the evaluation of a grating pitch are also reviewed.

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Fabrication of nano/micro dual-periodic structures by multi-beam evanescent wave interference lithography using spatial beats

Cited by 11 publications

References 24 publications

Longitudinal Mode Number Estimation of External Cavity Diode Laser Using Dual Periodic Grating for Optical Profiler System

Longitudinal Mode Number Estimation of External Cavity Diode Laser Using Dual Periodic Grating for Optical Profiler System

Theoretical investigation of two-dimensional sub-wavelength structures fabricated by multi-beam surface plasmon interference lithography

Laser Interference Lithography for Fabrication of Planar Scale Gratings for Optical Metrology

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