Fabrication of nanodevices using sub-25 nm imprint lithography

Krauss, Peter R.; Renstrom, Preston J.; Chou, Stephen Y.

doi:10.1109/drc.1996.546433

Cited by 1 publication

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“…In the technology of photonic crystal, usually use nanoimprint lithography (NIL) to fabricate. The nanoimprint lithography which is a hot embossing lithography is proposed by Stephen Y. Chou in 1995 [8]. Now, several NIL have been developed like in the following example: UV-NIL [6], soft lithography [9], a combined nanoimprint and photolithography (CNP) patterning technique [10,11], Laser-Assister Direct Imprint (LADI) process [12], and reversal imprinting [13].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Photonic Crystal Structures on Flexible Organic Light-Emitting Diodes by Using Nano-Imprint and PDMS Mold

Hsu

Chen

et al. 2016

MATEC Web Conf.

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Abstract.In this paper, nanoimprint lithography was used to create a photonic crystals structure film in organic light-emitting diode (OLED) component, and then compare the efficiency of components whether with nanostructure or not. By using two different kinds of mold, such as silicon mold and PDMS mold, the nano structures in PMMA (molecular weight of 350K) were fabricated. Nanostructures in period of 403.53nm with silicon mold and nano structures in period of 385.64nm with PDMS mold as photonic crystal films were fabricated and were integrated into OLED. In experimental results, the OLED without photonic crystal films (with packing) behaves 193.3cd/m 2 for luminous intensity, 3.481cd/A for lightening efficiency (K L ) and 0.781 lm/W for lightening power (K P ) where V is 14V and I is 5.5537mA; the OLED with photonic crystal films (with packing) behaves 241.6cd/m 2 for luminous intensity, 4.173cd/A for lightening efficiency (K L ) and 0.936 lm/W for lightening power (K P ) where voltage of 14V and current (I) of 5.7891mA, which shows that the latter perform is well.

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