2008
DOI: 10.1016/j.nimb.2008.03.213
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Fabrication of nanoporous silicon dioxide/silicon nitride membranes using etched ion track technique

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Cited by 23 publications
(11 citation statements)
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“…Based on this approach, a freestanding nanomembrane with ∼350 nm pores supported by microstructures (∼100 μm) was successfully fabricated, as shown in Figure a . In addition to the photolithographic process, a variety of methods including the block copolymer method, sacrificial particle method, track etching, and macromolding has been suggested to make hierarchical membrane structures using inorganic materials. These approaches have several strengths, such as relatively high throughput, excellent control over the pore diameter, and facile integration into microscale devices (e.g., microfluidic devices) .…”
Section: Applications Of Bio‐inspired Multiscale Structuresmentioning
confidence: 99%
“…Based on this approach, a freestanding nanomembrane with ∼350 nm pores supported by microstructures (∼100 μm) was successfully fabricated, as shown in Figure a . In addition to the photolithographic process, a variety of methods including the block copolymer method, sacrificial particle method, track etching, and macromolding has been suggested to make hierarchical membrane structures using inorganic materials. These approaches have several strengths, such as relatively high throughput, excellent control over the pore diameter, and facile integration into microscale devices (e.g., microfluidic devices) .…”
Section: Applications Of Bio‐inspired Multiscale Structuresmentioning
confidence: 99%
“…Various recent studies have concentrated on the evolvement of membranes with nanometer-scale pores [9], [141][142][143]. Several methods have been developed to fabricate nanoporous membranes such as lithography [65], [144], [145], ion track technique [146], selforganization [147], and sol-gel [91]. Most of these methods suffer from manufacturing complexity either in lithography processes or during membrane assembly to the microfluidic systems [141].…”
Section: 21mentioning
confidence: 99%
“…Microsieves were initially made from purely inorganic materials using photolithography, which facilitates the preparation of hierarchically structured microsieves via repeated cycles of lithographic structuring. The repertoire of methods to produce inorganic microsieves comprises furthermore non photo lithographic elements like the use of block copolymers as etch masks,13 the embedding of sacrificial particles as templates for pores,14 track etching,15 electroforming16, 17 and micromolding 18. Polymeric microsieves have been prepared by photolithography using directly the structured resist instead of transferring its structure into an underlying substrate 19.…”
Section: Analysis Of the Individual Batches Of Silica Particles Of Tmentioning
confidence: 99%