Fabrication of Nanostructures on Polyethylene Terephthalate Substrate by Interference Lithography and Plasma Etching

Abstract

We report results of an attempt to create nanostructures on polyethylene terephthalate substrate using the interference lithography and plasma etching technique. Methods to create nanogrooves, nanopillars, nanofins and nanoholes have been presented. The effects of chemical and physical etching associated with plasma etching on the synthesis of nanostructures were examined in detail. Different etch rates and anisotropy as a function of plasma power and pressure were reported and explained, offering good understanding of the physics of the etching process. Ways to improve anisotropy have been suggested and experimentally verified. We show that this method can produce nanostructured substrate with wide surface coverage and good uniformity. The flexibility of this method was demonstrated in that the period and shapes of the nanopattern can be varied easily without resorting to complicated fabrication processes and machinery. Our method brings forth an easy and cost-effective way to create uniform nanostructures on a large area in a controllable fashion.

Facile metal transfer method for fabricating unconventional metamaterial devices

“…A layer of photoresist (Ultra-i 123) was then spin-coated on it at 800 rpm for 150 s, and soft-baked at 90°C for 90 s [3]. The micron-size patterns were defined using optical lithography while sub-micron dots and holes were patterned using Lloyd's Mirror interference lithography (LIL) system [28,29]. After exposure, the sample was developed in Microposit MF CD-26 developer for 1 min.…”

“…The PET sample was placed on the cathode and was thus subject to both ion bombardment and chemical etching. A detailed study of the plasma etching mechanism and how the plasma condition relates to etching profile of the PET substrate has been done and reported previously [29]. It has been shown that as the power of oxygen plasma increases, more oxygen gets ionized in the chamber; the ions are more energetic and both lateral and vertical etch rate of the PET substrate increase.…”

A Design of Terahertz Broadband Filters and its Effect in Eliminating Asymmetric Characteristics in Device Structures

“…There are two types of substrates used in this work, 1 mm-thick quartz and 100 μm-thick polyethylene terephthalate (PET). The process was almost the same for both substrates except the use of photoresist; AZ1512 was used for quartz and ultra-i 123 was used for PET [34,35]. The fabrication starts with spincoating the respective photoresist on the substrate, at 2000 rpm for 1 min for AZ1512 and 800 rpm for 2.5 min for ultra-i 123 (step 1).…”

Synthesis and Characterization of Cobalt/Palladium Multilayer Film and Nanodiscs on Polyethylene Terephthalate Substrate

“…We have attempted to fabricate polymer based nanostructures using the interference lithography (IL) and plasma etching technique for biomedical research due to their potentials in biocompatibility and lower material cost. 21 22 We have also studied in detailed the plasma etching mechanisms 23 In this paper, we report the fabrication and characterization of the Co/Pd films and nanodisc arrays on PET substrate. The flexibility of the PET substrate offers the attractive potential for the fabrication of flexible magnetic devices.…”