Fabrication of nonlinear optical devices in ionically self-assembled monolayers

Abstract

The development of both "soft" and "hard" fabrication techniques for the patterning of nonlinear photonic devices in ionically selfassembled monolayer ͑ISAM͒ films is reported. A combination of electron beam lithography and reactive ion etching was used to pattern twodimensional holes with a lattice of 710 nm and diameters ranging from 550 to 650 nm. A soft alternative to this fabrication was also demonstrated. Nanoimprint lithography was successfully employed to pattern similar photonic structures with average hole diameters of 490 nm and a lattice spacing of 750 nm, as well as Bragg gratings with a period of 620 nm. Potential impact of this fabrication process on the chemical composition and nonlinear properties of the ISAM films was assessed using Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy, and second harmonic generation. The spectroscopy techniques confirmed that the chemical composition and bonding of the ISAM films was not adversely affected by the thermal cycles required for nanoimprinting. Second harmonic generation analysis also confirmed that the nanoimprinting process did not affect the nonlinear properties of the material, PCBS/PAH ISAM films, further indicating the suitability of such materials for the nanoimprinting of nonlinear optical photonic structures.

Effect of compression on self-assembled monolayers: a molecular dynamics study

“…SAMs are often used to coat such surfaces and to modify their adhesion and frictional properties. Some of their other potential applications are in lubrication [10], surface engineering, micro/nanofabrication [11], thin-film nonlinear optics, corrosion prevention and microlithography [12], biosensors [13], biological receptors, nonlinear optical materials [14], and selective filters for chemical sensors [15].…”

Synthesis and Nonlinear Optical Studies on Organic Compounds in Laser-Deposited Films

“…For each type, there are several techniques applied. Physical deposition techniques for thin organic films include physical vapor deposition (PVD) [38][39][40][41][42], organic vapor phase deposition (OVPD) [43][44][45], organic molecular beam deposition (OMBD) [46][47][48][49][50][51], solvent vapor annealing (SVA) [52][53][54][55][56], self-assembled monolayers (SAMs) [57,58], inkjet printing [59,60], pulsed laser deposition (PDL) [61][62][63][64], and laser evaporation [65][66][67] techniques. The chemical methods include solution techniques and gas-phase deposition methods.…”