2011
DOI: 10.1186/1556-276x-6-157
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Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching

Abstract: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etc… Show more

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Cited by 10 publications
(8 citation statements)
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References 23 publications
(30 reference statements)
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“…These include imprinting with optical diffraction grating [92], lithographically fabricated Si 3 N 4 [93] or Ni stamps [94], imprinting with self-assembled monoor multi-layer of microbeads [95,96], surface patterning by focused ion-beam (FIB) lithography [97][98][99], interference lithography [100], holographic lithography [101], block-copolymer lithography [102], step-and-flash imprint lithography (SFIL) [103], and soft lithography utilizing elastomeric poly-dimethylsiloxane (PDMS) stamp [104]. Each of these techniques has its advantages and disadvantages.…”
Section: Control Of the Arrangement And Shape Of The Poresmentioning
confidence: 99%
“…These include imprinting with optical diffraction grating [92], lithographically fabricated Si 3 N 4 [93] or Ni stamps [94], imprinting with self-assembled monoor multi-layer of microbeads [95,96], surface patterning by focused ion-beam (FIB) lithography [97][98][99], interference lithography [100], holographic lithography [101], block-copolymer lithography [102], step-and-flash imprint lithography (SFIL) [103], and soft lithography utilizing elastomeric poly-dimethylsiloxane (PDMS) stamp [104]. Each of these techniques has its advantages and disadvantages.…”
Section: Control Of the Arrangement And Shape Of The Poresmentioning
confidence: 99%
“…In the past, AAO nanochannel arrays were grown in phosphoric or oxalic acid. The results of analysis of the circularities of the holes produced from one-step AAO processes [16][17][18][19][20][21][22][23][24][25][26][27] are shown in Figure 1. It can be seen that it is difficult to grow good quality arrays with a period in the range from 150 to 300 nm in phosphoric acid using the traditional AAO method.…”
Section: Definition and Simulationmentioning
confidence: 99%
“…To improve the control of the formation of AAO arrays, various top-down methods have been proposed in the literature to prepattern the aluminum surface prior to the electrochemical treatment. Among them, focused ion beam lithography [8], holographic lithography [9], block copolymer micelles [10], soft imprinting [11], mould-assisted chemical etching [12], colloidal lithography [13], nanoindentation [14], nanoimprint lithography (NIL) [15,16], and guided electric field [17] can be cited. Such approaches are not only very interesting in terms of pores positioning and control of pore's size distribution but also allow the use of a micrometer-thick initial aluminum layer supported by a silicon wafer.…”
Section: Introductionmentioning
confidence: 99%