Fabrication of patterned media for high density magnetic storage

Ross, Caroline A.; Smith, Henry I.; Savas, T. A.; Schattenburg, Mark L.; Farhoud, M.; Hwang, M.; Walsh, Michael; Abraham, Mathew C.; Ram, Rajeev J.

doi:10.1116/1.590974

Cited by 253 publications

(121 citation statements)

References 51 publications

Supporting

Mentioning

121

Contrasting

Order By: Relevance

“…If a particle is small, it is uniformly magnetized and if its size is large enough a non-uniform (vortex) magnetization is more energy preferable (see, for example, Refs. 21,22,23,24,25,26,27,28). Besides the geometrical form and size, the state of the particle depends on many other factors.…”

Section: Introductionmentioning

confidence: 99%

Possibility of a long-range proximity effect in a ferromagnetic nanoparticle

Силаев

2009

Phys. Rev. B

View full text Add to dashboard Cite

We study the proximity effect in a ferromagnetic nanoparticle having a vortex magnetization pattern. We show that for axisymmetric system consisting of a circular particle and a magnetic vortex situated at the center of it no long range superconducting correlations are induced. It means that induced superconductivity is localized in the small area near the superconducting electrode. However, in the real systems axial symmetry can be broken by either a shift of the magnetic vortex from the origin or geometrical anisotropy of the ferromagnetic particle. In this case a long range proximity effect is possible.

show abstract

Section: Introductionmentioning

confidence: 99%

Possibility of a long-range proximity effect in a ferromagnetic nanoparticle

Силаев

2009

Phys. Rev. B

View full text Add to dashboard Cite

show abstract

“…Although optical lithography has high throughput, the smallest size of features that can be produced is limited by the long optical wavelength. Among many nanofabrication methods, [10][11][12][13][14][15] a promising technique is based on masks with sub-100-nm self-assembled pores. Such masks, for example, can be fabricated by the anodization of aluminum under appropriate experimental conditions.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and structural characterization of highly ordered sub-100-nm planar magnetic nanodot arrays over 1cm2 coverage area

Roshchin

Batlle

et al. 2006

Journal of Applied Physics

View full text Add to dashboard Cite

Porous alumina masks are fabricated by anodization of aluminum films grown on both semiconducting and insulating substrates. For these self-assembled alumina masks, pore diameters and periodicities within the ranges of 10-130 and 20-200 nm, respectively, can be controlled by varying anodization conditions. 20 nm periodicities correspond to pore densities in excess of 10 12 per square inch, close to the holy grail of media with 1 Tbit/ in. 2 density. With these alumina masks, ordered sub-100-nm planar ferromagnetic nanodot arrays covering over 1 cm 2 were fabricated by electron beam evaporation and subsequent mask lift-off. Moreover, exchange-biased bilayer nanodots were fabricated using argon-ion milling. The average dot diameter and periodicity are tuned between 25 and 130 nm and between 45 and 200 nm, respectively. Quantitative analyses of scanning electron microscopy ͑SEM͒ images of pore and dot arrays show a high degree of hexagonal ordering and narrow size distributions. The dot periodicity obtained from grazing incidence small angle neutron scattering on nanodot arrays covering ϳ2.5 cm 2 is in good agreement with SEM image characterization. © 2006 American Institute of Physics. ͓DOI: 10.1063/1.2356606͔ INTRODUCTIONNanostructured magnets have attracted great attention recently due to their unique magnetic properties which are completely different from those of continuous films and bulk materials. [1][2][3][4] In addition, nanoscale studies may shed light on the heavily investigated mechanism of exchange bias 5-9 existing in ferromagnet ͑FM͒-antiferromagnet ͑AF͒ bilayers. Fabrication of sub-100-nm FM single layer and FM/AF bilayer nanostructures offers a great opportunity for research on fundamental magnetism at the nanoscale.A variety of methods are used for nanofabrication, including electron beam and optical lithography. The low throughput and high cost of electron beam lithography lead to limited applicability for the fabrication of nanopatterns with large coverage area. Although optical lithography has high throughput, the smallest size of features that can be produced is limited by the long optical wavelength. Among many nanofabrication methods, 10-15 a promising technique is based on masks with sub-100-nm self-assembled pores. Such masks, for example, can be fabricated by the anodization of aluminum under appropriate experimental conditions. [16][17][18][19][20][21][22] Arrays of nanopores with tunable pore diameter covering more than 1 cm 2 demonstrate the potential application of porous alumina ͑AlO x ͒ masks for nanostructure fabrication. Previously, alumina membranes obtained from the anodization of thick ͑Ͼ100 m͒ aluminum foils were mostly used for the fabrication of nanowires. [23][24][25][26][27][28][29][30] These nanowires were grown by electrodeposition, which cannot be easily adapted for the fabrication of nanodots with controlled and uniform thickness. Moreover, this method requires transfer of the alumina membranes onto a substrate. Insufficient adhesion between the membrane and substrate,...

show abstract

“…There has been much interest in the patterning of magnetic media [6][7] because of its potential to enable areal densities in magnetic recording beyond the super paramagnetic limit, where the magnetic energy stored in individual grains is too small for long-term thermal stability. Moreover, higher areal densities require smaller and smaller grain sizes for reduction of signal-to-noise ratio.…”

Section: Magnetic Dot Arraysmentioning

confidence: 99%

UV Nanoimprint Lithography and Its Application for Nanodevices

Fukuhara

Ono

Hirasawa

et al. 2007

J. Photopol. Sci. Technol.

View full text Add to dashboard Cite

Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

show abstract

Fabrication of patterned media for high density magnetic storage

Cited by 253 publications

References 51 publications

Possibility of a long-range proximity effect in a ferromagnetic nanoparticle

Possibility of a long-range proximity effect in a ferromagnetic nanoparticle

Fabrication and structural characterization of highly ordered sub-100-nm planar magnetic nanodot arrays over 1cm2 coverage area

UV Nanoimprint Lithography and Its Application for Nanodevices

Contact Info

Product

Resources

About