“…Various kinds of microfabrication processes were developed and studied by the researchers over the decades including surface micromachining [2], bulk micromachining [3], and LIGA process [4] until recently, when three-dimensional (3D) microstructures like microlenses, micro/nanotips, microtrapezoids have been focused in various microsystems such as microfluidics, micro optics, electronic and mechanical devices [5][6][7][8] for which these processes have been considered inadequate. New processes were introduced in order to fabricate such complex 3D microstructures including deep reactive ion etching [9], inclined UV lithography [10], thermal reflow [11,12], focused ion beam [13,14], UV proximity printing [15,16], UV microstamping [17] and so on [18,19]. However, these 3D microfabrication processes revealed various kinds of limitations and disadvantages such as most of them require special equipments, process is costly, have low throughput and above all most of the processes are limited to specific pattern fabrication.…”