Fabrication of self-assembled monolayer patterns by selective electron beam irradiation and a chemical adsorption technique

Mino, Norihisa; Ozaki, Shinji; Ogawa, Kazufumi; Hatada, Motoyoshi

doi:10.1016/0040-6090(93)04155-l

Cited by 29 publications

(18 citation statements)

References 11 publications

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“…SAMs have been shown to work as electron beam resists for wet chemical pattern transfer at doses less than or comparable to other high-resolution electron beam resists 4 -6 and also for selective electroless metallization, 7 electroplating, 8 selective mineralization, 9 and selective monolayer deposition. 10,11 Self-assembled monolayer based resists have also been explored for scanning tunneling microscopy ͑STM͒ lithography. At these very low beam energies, the electron penetration is very short, and thin ͑ϳ2.5 nm͒ monolayers are an excellent choice for ultra-high-resolution work.…”

Section: Introductionmentioning

confidence: 99%

Pattern transfer of electron beam modified self-assembled monolayers for high-resolution lithography

Lercel¹

1995

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Section: Introductionmentioning

confidence: 99%

Pattern transfer of electron beam modified self-assembled monolayers for high-resolution lithography

Lercel¹

1995

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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“…The recent growing interest in organized molecular films, and the availability of advanced surface analysis techniques, led to numerous studies of solid-supported organic mono- and multilayer systems involving XPS (X-ray photoelectron spectroscopy) as a principal tool of investigation. − XPS has been used to provide qualitative as well as detailed quantitative information about the composition and structure of various such films. Depending on the type of information desired, XPS data have been acquired with X-ray exposures ranging from a few minutes to several hours.…”

Section: Introductionmentioning

confidence: 99%

Monolayer Damage in XPS Measurements As Evaluated by Independent Methods

et al. 1997

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The damage caused to amphiphilic n-alkane monolayers under XPS measurement conditions was assessed in a combined XPS-FTIR study supplemented by additional AFM imaging and contact angle measurements. Nine different self-assembled monolayer/substrate systems were examined, comprising a long chain silane (C18, OTS), a short chain silane (C1, MTS), a functional (COOH-terminated) long chain silane (C18, NTSox), a long chain carboxylic acid (C20, AA), and four different solid substrates (silicon, quartz, glass, and ZnSe). Significant differences were observed in the behavior of the various examined monolayer systems under identical X-ray irradiation conditions. These are interpreted in terms of effects associated with the specific mode of layer-to-surface and intralayer coupling, the size of the monolayer hydrocarbon core, and the presence of radiation-sensitive functional groups in the layer. All these factors and their influence on the degradation path followed by a particular monolayer upon exposure to the X-rays were found to be interrelated, giving rise to a variety of possible damage patterns, including an unexpected overall stabilization effect initiated by the preferential rapid loss of a labile top functional group (NTSox). XPS is shown to be insufficient as a tool for the evaluation of the radiation-induced damage in such ultrathin films, because of its insensitivity to loss of hydrogen and to structural transformations that occur without a net loss of carbon from the surface. Independent methods of surface analysis (mainly FTIR), applied in conjunction with XPS, provide a more comprehensive picture of the induced damage, thus permitting a realistic interpretation of the XPS experimental data as well as the design of improved data acquisition procedures. This could also assist in the tailoring of monolayers with predetermined degradability, for specific purposes. Finally, results of combined AFM-XPS-FTIR-contact angle measurements suggest the possible formation of a “diamond-like” surface film upon extensive X-ray irradiation of an OTS/Si monolayer.

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“…Recent work has shown that surface reactivity templates can be fabricated by microcontact-printing processes, in which organosilanes are directly deposited for chemisorption at predetermined sites on a hydroxyl-bearing surface using a stamp. More often, however, a homogeneous organosiloxane SAM is patterned using either direct write processes involving exposure sources such as electron beams, ion beams, and proximal probes or conventional masked-based photolithographic processes using UV , or extreme ultraviolet (EUV) exposure sources. The templates formed are subsequently chemically reacted in one or more steps to covalently bind a species of interest to the film.…”

mentioning

confidence: 99%

Fabrication of Patterned Amine Reactivity Templates Using 4-Chloromethylphenylsiloxane Self-Assembled Monolayer Films

et al. 1999

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Fabrication of self-assembled monolayer patterns by selective electron beam irradiation and a chemical adsorption technique

Cited by 29 publications

References 11 publications

Pattern transfer of electron beam modified self-assembled monolayers for high-resolution lithography

Pattern transfer of electron beam modified self-assembled monolayers for high-resolution lithography

Monolayer Damage in XPS Measurements As Evaluated by Independent Methods

Fabrication of Patterned Amine Reactivity Templates Using 4-Chloromethylphenylsiloxane Self-Assembled Monolayer Films

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