2011
DOI: 10.1016/j.solmat.2010.04.024
|View full text |Cite
|
Sign up to set email alerts
|

Fabrication of silicon nanowire arrays based solar cell with improved performance

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

1
100
0

Year Published

2012
2012
2017
2017

Publication Types

Select...
5
4

Relationship

0
9

Authors

Journals

citations
Cited by 170 publications
(101 citation statements)
references
References 11 publications
1
100
0
Order By: Relevance
“…Our black Si surfaces achieved reflections less than 1.0% over a wavelength range from 300 to 1200 nm. SiNW-based rough Si surfaces fabricated by conventional solar cell fabrication protocol, 35 including surface passivation and back surface field forming, 29,30 have been developed for solar cell integration. Similar approaches can be applied to our black Si surfaces for photovoltaic applications.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…Our black Si surfaces achieved reflections less than 1.0% over a wavelength range from 300 to 1200 nm. SiNW-based rough Si surfaces fabricated by conventional solar cell fabrication protocol, 35 including surface passivation and back surface field forming, 29,30 have been developed for solar cell integration. Similar approaches can be applied to our black Si surfaces for photovoltaic applications.…”
Section: Discussionmentioning
confidence: 99%
“…Subwavelength structures especially silicon nanowires (SiNWs) are also widely studied to achieve high light absorption in the visible and NIR range. 26,29,30 Kumar et al 29 fabricated SiNW arrays and applied them to solar cells. The maximum reflection of their black Si surface was approximately 4% between 300 and 1000 nm.…”
mentioning
confidence: 99%
“…Several techniques including reactive ion etching (RIE) [2], plasma immersion ion implantation etching [12], metal assisted chemical etching [13] and laser-induced etching [14] have been implemented to form nanotextured Si solar cell surfaces. However, these nanotexturing processes (except for the metal assisted chemical etching process) are rather expensive.…”
Section: Introductionmentioning
confidence: 99%
“…Among the preparation methods for such nanostructures [11,12], metalassisted chemical etching is well-received as one of the viable technique to produce highly ordered Si nanostructure arrays, as this simple technique is effective and cost effective. Porous silicon nanowires (PSiNWs) prepared by metal-electroless etching technique (13,14) have been widely explored as an alternative top-down route for the fabrication of nanostructures that give visible light emission and good electronic transport properties [15,16]. In this paper, we study the morphology of PSiNWs and the optical properties of this nanostructures.…”
Section: Introductionmentioning
confidence: 99%