2015
DOI: 10.1021/acs.nanolett.5b00967
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Fabrication of Sub-25 nm Diameter GaSb Nanopillar Arrays by Nanoscale Self-Mask Effect

Abstract: GaSb individual nanowires and nanowire arrays are considered as intriguing candidates for electronic and photonic applications. In this paper, we report a new mask-free method to fabricate large area GaSb nanopillar arrays through reactive ion etching of GaSb substrates facilitated by O2 plasma. We have shown that nanoscale oxide self-masks could form thereby facilitating the formation of GaSb nanopillars. We have achieved GaSb nanowires with diameters less than 25 nm and an aspect ratio of 24. Additionally, G… Show more

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Cited by 12 publications
(14 citation statements)
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“…Lin et al reported a self-mask RIE method to create a GaSb nanopillar below 25 nm [70]. A partially-formed oxide layer was formed on top of the GaSb substrate while being exposed to oxygen plasma which acted as a mask to slow down the etching rate of the protected area.…”
Section: Top-downmentioning
confidence: 99%
See 1 more Smart Citation
“…Lin et al reported a self-mask RIE method to create a GaSb nanopillar below 25 nm [70]. A partially-formed oxide layer was formed on top of the GaSb substrate while being exposed to oxygen plasma which acted as a mask to slow down the etching rate of the protected area.…”
Section: Top-downmentioning
confidence: 99%
“…Copyright 2017 American Chemical Society). (d) Top-down: GaSb NWs fabricated by a self-masked top-down technique[70] (adapted with permission from[70]. Copyright 2015 American Chemical Society).…”
mentioning
confidence: 99%
“…In the past decades, 'bottom-up' approach has become more popular for controllable growth of the expected Sb-based III-V NWs with large material diversity and good control over diameter, stoichiometry and doping. [42]. As shown in figure 2(a), the partially formed oxide on the surface of GaSb serves as a mask, and the unprotected GaSb substrate will be etched away, resulting in surface nanostructure.…”
Section: Recent Advances In the Synthesis Of Sb-based Iii-v Nwsmentioning
confidence: 99%
“…In the various proposed resolutions, developing NW field-effect transistors (NWFETs) with high hole mobility channel materials has been one of the optimal choices [33][34][35]. With the highest hole mobility of 1000 cm 2 V −1 s −1 among all III-V semiconductors [12,[36][37][38][39][40], GaSb NWs has been regarded as the potential substitution of p-type Si in the low-power and high speed FETs [41,42]. With a diameter around 10 nm, Yang et al demonstrated that the hole mobility of 111 á ñ-oriented GaSb NWs can reach ∼200 cm 2 V −1 s −1 [43].…”
Section: Introductionmentioning
confidence: 99%
“…Silicon wafers were chosen here because it is the most commonly used substrate in nanostructure fabrication. As reported before, diameters of the resulted nanoprotrusions were determined by the size of SiO 2 nanoparticles and the height was controlled by the RIE etching time. The density of nanoprotrusions on the surface was varied by changing the concentration of SiO 2 nanoparticle solution.…”
Section: Resultsmentioning
confidence: 96%