Fabrication of submicron-sized structures on hybrid sol-gel glass with electron-beam lithography

Abstract

An electron-beam sensitive inorganic-organic hybrid Si02/Ti02 glass was synthesized for the fabrication of structures with sub-micron sized features. The sensitivity of the sol-gel material was characterized with the electron beam dosage and the optimized doses were found to cross-link the material for sub-micron structures. Due to its properties of low thermal expansion, good mechanical strength and chemical durability, the sol-gel material can be used as resistance in the dry etching process in optoelectronics fabrications. For micro-optical elements, the diffractive optical elements can be fabricated directly into the sol-gel glass without etching.