Fabrication of the nanoimprint template with periodic structures

Abstract

The holographic lithography -ion beam etching is adopted to fabricate the nanoimprint template with periodic structures. The accurate control of the high aspect ratio of the profile is achieved by the optimization of the holographic lithography and the choice of the appropriate parameters of ion beam etching. There are two major challenging steps of this method: 1) the holographic exposure and development in the fabrication of the photoresist mask and 2) the ion beam etching to transfer the photoresist mask to the fused silica. The experiment indicates that titled rotation of the ion beam etching combined with reactive ion beam etching can achieve the accurate control of the high aspect ratio structure. Two types of nanoimprint template have been fabricated: the period of 250nm and the groove depth of 380nm; the period of 600nm and groove depth of 1400nm, respectively.