Fabrication of thick Cr masks for reactive ion substrate etching by electron beam lithography and lift-off techniques

Abstract

Fabrication of tall Cr nanostructures of different shapes by lithography and lift-off processes is demonstrated. By varying resist thickness, metal layer thickness, and diameter of holes in the resist mask, it is demonstrated that metal structures with shapes ranging from sharp-tipped conical over flat-top cones to nearly cylindrical can be fabricated. A comparison of resist layer dissolution in acetone, covered by Ag and Cr films, reveals that Cr films grow with an open structure of particles that allow rapid solvent diffusion through Cr layers that are several hundred nanometers thick. On the other hand, the 2D growth of Ag on the resist forms a barrier against acetone diffusion. The open structure of Cr enables the lift-off process to fabricate several-μm-high nanostructures using a single resist layer. As an example, high-aspect-ratio Si structures are demonstrated by reactive ion etching using thick Cr layers as a mask, fabricating nanopillars with 3 μm height at room temperature.