2014
DOI: 10.1007/s10948-014-2730-x
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Fabrication of Thick REBCO–Coated Conductors with High Performance on Metal Tapes by Pulsed Laser Deposition Process

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Cited by 8 publications
(4 citation statements)
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“…For example, if we double the thickness of a tape and retain the same J c in high fields, we can expect the selffield J c to decrease by ∼ 20 %. A decrease in self-field J c with thickness has been seen by many authors [17]- [22] (but not all [23]) and is often attributed to defects.…”
Section: Self Field Calculationsmentioning
confidence: 85%
“…For example, if we double the thickness of a tape and retain the same J c in high fields, we can expect the selffield J c to decrease by ∼ 20 %. A decrease in self-field J c with thickness has been seen by many authors [17]- [22] (but not all [23]) and is often attributed to defects.…”
Section: Self Field Calculationsmentioning
confidence: 85%
“…On the conductor development side, the introduction and development of artificial pinning centers (APCs) have resulted in a remarkable improvement of in-field performance over a wide range of temperatures and fields . In addition, the problems associated with the growth of thicker (>1 µm) films without degradation of critical current density (J c ) have been addressed [14][15][16][17][35][36][37][38][39][40][41][42][43][44][45][46][47], resulting in a notable increase in CC performance via growth of >4 µm thick films with optimized APCs, as demonstrated for intermediate temperatures and fields (30-50 K, 3-7 T), as well as at 4.2 K and fields up to 31.2 T [15,16,33].…”
Section: Introductionmentioning
confidence: 99%
“…Significant progress in understanding and overcoming obstacles to growing thick REBCO films with high current densities has been made in recent years [16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32]. Additionally, the understanding and control of the parameters influencing the effectiveness of artificial pinning centers (APC) in increasing in-field critical currents has significantly progressed from both fundamental and processing aspects [16-18, 20, 33-61].…”
Section: Introductionmentioning
confidence: 99%