Fabrication of Titanate Barium Films by Electrophoretic Deposition Technique

Abstract

EPD (electrophoretic deposition) technique has been shown as an effective method to produce thin ore thick layers at voltage 5-100 V onto Ni conductive substrate. The aim of this study is to use the EPD method to fabricate films from suspensions BaTiO 3 . The effects of the EPD process parameters such as the suspension concentration, deposition time, electrical field strength on the specific EPD deposited weight, morphology particles were used. The surface microstructures of the as-deposited films were investigated by SEM (scanning electron microscopy). A homogeneous microstructure was obtained at applied electric field of 100 V and 1 min of deposition time at an electrode distance of 1.0 cm.