We report a fabrication of transparent ZnO thick films by a chemical bath deposition using zinc acetate ethanolic− aqueous solutions with cetyltrimethylammonium chloride (CTAC). In this system, CTAC plays a particular role in nucleation and crystal growth of ZnO, and the micrometer-thick ZnO films formed on ZnO-buffered glass substrates. The resultant ZnO thick films show a high transmittance of around 80% in the visible region. An orientation of ZnO nuclei formed on the substrates in the early stage is different from a c-axis orientation of the ZnO-buffer layer, and the resultant ZnO thick films also show the unusual orientation. The detailed information on the orientation of these ZnO films was analyzed based on X-ray diffraction (XRD) 2θ/θ scan measurements at angles between in-plane and out-of-plane geometries. According to the results, the c-axis of ZnO is tilted at around 40−50°with respect to the film normal, and the micrometer-thick ZnO films exhibit the (112)-plane orientation by adjusting the CTAC concentration of reaction solutions.
■ INTRODUCTIONZinc oxide (ZnO) is an important material attracting considerable research interest due to its wide-ranging applications such as in photoluminescence, 1−3 photocatalysis, 4,5 dye-sensitized solar cells, 6−9 and sensors. 10−12 Moreover, Aland Ga-doped ZnO are potential candidates for transparent conductive oxide (TCO) materials, 13−15 which are used in various electronic devices such as flat-panel displays and solar cells. Indium tin oxide films are representative TCO films used in these electronic devices, 16−18 though alternative materials are needed due to the problem of acquiring indium resources. Since zinc is a ubiquitous element, ZnO is an appropriate alternative.High-quality TCO films are generally fabricated by a sputtering process, 14−16 which requires a large equipment with a vacuum system and is a high energy-cost process as well as an atomic layer deposition process and chemical vapor deposition process. 18,19 In contrast, direct deposition methods such as a chemical bath deposition (CBD) and a liquid phase deposition are attracting attention as low-cost film formation processes. In these processes, nucleation and crystal growth on substrate in solution result in the formation of metal−oxide and metal−chalcogenide films. 19−21 Fabrication processes of microstructured ZnO films have been intensively studied by many researchers. 22−29 For application to TCO films, it is necessary to prepare ZnO thick films to reduce the resistivity, though the thick films prepared by solution processes tend to cause severe light scattering due to the formation of internal pores or voids. In the present study, we attempted to fabricate transparent ZnO thick films by the CBD method. Although there are a number of reports for controlling the morphology of ZnO films by the CBD method, the fabrication of transparent ZnO thick films is not easy. The transparency of thick films fabricated in solutions has been discussed in some studies in recent years. 30−34 As seen in ref ...