Fabrication of Transparent Very Thin SiOx Doped Diamond-Like Carbon Films on a Glass Substrate

Abstract

A novel direct current (DC) magnetron sputtering system via radio frequency (RF) bias with hexamethyldisiloxane (HMDSO) plasma polymerization was developed for the deposition of SiO x-doped diamond-like carbon (DLC) films on a glass substrate. As the RF bias increased, the ratio of intensity of D peak and G peak (I(D)/I(G)) decreased and the G peak shifted to a low position, leading to high hardness and a large portion of sp 3 bonds. Additionally, weak sp 2 graphite bonds were broken and sp 3 diamond bonds formed because the RF bias attracted hydrogen ion bombarding the DLC films. Increasing DC power was helpful to improve the hardness of the DLC films because the proportion of sp 3 bonds and the I(D)/I(G) ration was increased. HMDSO was introduced into this process to form SiO x :DLC films with enhanced optical performance. The average transmittance in the visible region of these very thin SiO x :DLC films with a thickness of 37.5 nm was 80.3% and the hardness of the SiO x :DLC films was increased to 7.4 GPa, which was 23.3% higher than that of B270 substrates.

Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor

“…In the phase of plasma polymerisation of the protective coating, however, the electron energy was spent preferentially on partial dissociation of the HMDSO precursor. The nature of the deposited film and lack of highly reactive oxygen-containing radicals enabled preservation of the C-Si-O bonds and thus formation of a coating resembling polydimethylsiloxane rather than more extensive oxidation of the protective coating and consequent formation of SiO x clusters in the film, which was observed by several other authors upon intentionally adding oxygen to HMDSO upon plasma deposition of protective coatings [6,8,[10][11][12].…”

“…For the deposition of Si-containing films, various precursors can be used [2][3][4], one of the most popular of which is hexamethyldisiloxane (HMDSO). It is used for the deposition of various coatings ranging from polymers to almost pure SiO x films [5,6]. HMDSO is liquid at atmospheric pressure, but the vapour pressure is rather large (approximately 50 mbar at room temperature); therefore, it is suitable for introduction into a processing chamber via a leak valve or a gas flow controller.…”

Manipulated Optical Absorption and Accompanied Photocurrent Using Magnetic Field in Charger Transfer Engineered C/ZnO Nanowires

“…The sp 2 states in our a‐C /ZnO NWs increased with increasing a‐C sputtering power, which is consistent with the findings of other studies. [ 30,31 ] In addition, XAS provided information on the electronic structure of the NWs, especially their valence states. The normalized Zn K‐edge X‐ray absorption near‐edge structure (XANES) spectra of different a‐C /ZnO NWs are displayed in Figure 4c.…”

Deposition of a‐C:H:SiOx Coatings Using Low‐Frequency Inductively Coupled Plasma

“…In the literature, they are also referred to as SiO x -doped DLC or diamond-like nanocomposite (DLN). [20,21] These coatings consist of DLC bonds chemically stabilized by hydrogen atoms and quartz-like silicon bonds chemically stabilized by oxygen atoms. The lower residual stress level is the main advantage of these coatings compared to a-C and a-C:H DLC coatings.…”