2020
DOI: 10.3390/coatings10080720
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Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Abstract: Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon dioxide (SiO2) thin films have been prepared by plasma ion-assisted deposition (PIAD). The optical, structural, and mechanical properties of thin films have been investigated using spectrometer/ellipsometer, X-ray diffraction (XRD), atomic force microscopy (AFM)… Show more

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Cited by 20 publications
(10 citation statements)
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“…Luckely, SiO 2 layers usually show a built-in compressive stress, whereas TiO 2 layers show a built-in tensile stress 31 , so that they act in compensation when the SiO 2 /TiO 2 multilayer is deposited. Moreover, by depositing the structure at a specific temperature or treating it with postdeposition annealing cycles, the total built-in stress can be reduced to values lower than 5 MPa 30 . Thermal gradients produce additional stress that adds to the built-in stress.…”
Section: Resultsmentioning
confidence: 99%
“…Luckely, SiO 2 layers usually show a built-in compressive stress, whereas TiO 2 layers show a built-in tensile stress 31 , so that they act in compensation when the SiO 2 /TiO 2 multilayer is deposited. Moreover, by depositing the structure at a specific temperature or treating it with postdeposition annealing cycles, the total built-in stress can be reduced to values lower than 5 MPa 30 . Thermal gradients produce additional stress that adds to the built-in stress.…”
Section: Resultsmentioning
confidence: 99%
“…From the absorbance (A) obtained from spectrophotometer, other properties such as transmittance, extinction coefficient and band gap were calculated. Transmittance (T) was determine using equation (7) as given by [30,31].…”
Section: Optical Propertiesmentioning
confidence: 99%
“…Deposition of thin film of TiO 2 on glass substrate using electron beam evaporation causes tensile residual stress in the order of 170 MPa [ 38 ]. While deposition of thin film of SiO 2 on a thin film of TiO 2 causes a compression stress in the same order to form [ 39 , 40 ]. Deposition of silver on the other hand causes a tensile stress in the order of 18 Pa which gives a radius of curvature in the range of thousands of kilometers according to Stoney’s equation [ 38 ].…”
Section: Device Designmentioning
confidence: 99%