We report on the fabrication of CdSnP2 thin films for photovoltaic application. The phosphidation method, where co-sputtered Cd-Sn precursor thin film reacts with phosphorus gas, was utilized for the preparation of CdSnP2 thin films. In order to establish the fabrication process, the temperature dependence on product phases was investigated and CdSnP2 thin films were obtained by the phosphidation at 350 C for 30 min under the phosphorus vapor pressure of 10 −2 atm. CdSnP2 thin films showed a n-type conduction.The resistivity, the carrier concentration and the mobility were evaluated to be 3.5−3.7×10 2 Ω cm, 1−3×10 15 cm −3 and 4.7−17 cm 2 V −1 s −1 , respectively. CdSnP2 thin films with relatively flat and smooth surface were obtained, although it was reported that ZnSnP2 with the same crystal structure grew as the protrusion shape by the VLS growth mode. In order to investigate these difference in growth mechanism between CdSnP2 and ZnSnP2, the reaction process in Cd-Sn-P system was investigated and discussed based on the chemical potential diagrams. As the result, it was understood that Cd, Sn and P4 directly reacted to form CdSnP2, while ZnSnP2 was formed via the reaction among Zn3P2, Sn and P4 after Zn reacts with P4 to produce Zn3P2. Therefore, it is speculated that simple reaction route results in the high growth speed and smooth flat morphology was obtained in the fabrication of CdSnP2 thin films..