Photoelectrochemical etching of n-TiO 2 (rutile) single crystals produced ordered arrays of nanogrooves with the spacing of about 300 nm over a macroscopically wide area of 0.5 × 0.5 cm at the surface without any use of imprints or templates. Moreover, the photoetching by irradiation with patterned light intensities gave nanogrooves with a desired depth at a desired location, interesting from the point of view of nanoscience and nanotechnology. A plausible model is proposed for the formation of ordered arrays of nanogrooves in terms of self-organized photoetching in which autocatalytic accelerated photoetching at the bottom of the grooves, caused by an excess concentration of photogenerated holes due to a high potential gradient, is coupled with its retardation by a downward shift in the flat-band potential of n-TiO 2 at the bottom of the grooves, induced by an increase in the solution pH due to accelerated photoreactions.