2019
DOI: 10.1016/j.apsusc.2019.05.079
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Facile deposition and characterization of large area highly conducting and transparent Sb-doped SnO2 thin film

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Cited by 61 publications
(40 citation statements)
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“…Commonly used doped variants of SnO 2 contain Fat the anion site which is a good candidate to replace ITO and possesses a resistivity of $ 4 Â 10 À4 X cm and an over 80% transmittance [12][13][14]. Additionally, antimony (Sb) with a resistivity of around 6 Â 10 À4 X cm and approximately 80% transmittance [15][16][17] and tantalum (Ta) [11,18] at the cation site can also be used as dopants to improve conductivity. Consequently, research on doped SnO 2 is crucial for discovering alternative TCO materials.…”
Section: Graphical Abstract Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Commonly used doped variants of SnO 2 contain Fat the anion site which is a good candidate to replace ITO and possesses a resistivity of $ 4 Â 10 À4 X cm and an over 80% transmittance [12][13][14]. Additionally, antimony (Sb) with a resistivity of around 6 Â 10 À4 X cm and approximately 80% transmittance [15][16][17] and tantalum (Ta) [11,18] at the cation site can also be used as dopants to improve conductivity. Consequently, research on doped SnO 2 is crucial for discovering alternative TCO materials.…”
Section: Graphical Abstract Introductionmentioning
confidence: 99%
“…To date, a wide variety of synthetic pathways towards doped SnO 2 thin films have been reported including magnetron sputtering, [19] pulsed laser deposition (PLD) [20,21], spin coating [22][23][24], spray pyrolysis [15,25,26] and aerosol-assisted chemical vapour deposition (AACVD) [11,12,27]. AACVD is a variant of conventional CVD which depends on carrier gas transporting precursor aerosols to the deposition zone with elevated temperature.…”
Section: Graphical Abstract Introductionmentioning
confidence: 99%
“…Various techniques were used to deposit SnO 2 material, for instance sol-gel, chemical vapor deposition (CVD), metal organic deposition, and radio frequency (RF) sputtering. The latter was adopted in this work due to its successful use in the processing of thin, adherent, stable, and reproducible films [ 23 , 24 ].…”
Section: Introductionmentioning
confidence: 99%
“…[26,27] Previous studies of ATO coatings deposited by ultrasonic spray pyrolysis have individually and unsystematically explored the structural, electrical, and optical properties of the deposited films by altering some of the key parameters including dopant concentration, film thickness, and processing temperature. [28][29][30][31][32] However, a comprehensive investigation of these parameters and a deeper understanding of their role is still required to generate reproducible, high performance ATO films.…”
Section: Introductionmentioning
confidence: 99%