Facile electron-beam lithography technique for irregular and fragile substrates

Chang, Jiyoung; Zhou, Qin; Zettl, A.

doi:10.1063/1.4900505

Cited by 7 publications

(4 citation statements)

References 16 publications

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“…The general principle of the strategy presented here is in its core similar to a method presented by Chang et al [16] who fabricated 200 nm thick solid electron-sensitive PMMA dry film photoresist sheets by spin-coating. These PMMA films were directly transferred onto various non-planar substrate surfaces such as edges, silicon nitride bridges and deposited gold wires, followed by conventional electron beam lithography, metal deposition and resist lift-off.…”

Section: Introductionmentioning

confidence: 99%

Facile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithography

Nilsen

Port

Roos

et al. 2019

J. Micromech. Microeng.

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A photolithographic technique based on dry film photoresists for facile and low-cost patterning of microcantilever beams is presented. Dry film photoresists enable instantly homogenous photoresist coatings on flexible and 3D patterned substrate surfaces, represented here by microcantilever beams, which is otherwise challenging if conventional spin-coating of photoresist is utilized. Compared to alternative microtechnologies, such as focused ion beam milling or resist spray coating, our strategy is far less elaborate, fully compatible with routine additive and subtractive microfabrication processes and can be readily scaled. We show specifically microcantilever shape modification by CF 4 reactive ion etching, localized metal deposition in combination with conventional lift-off procedures as well as a utilization of patterned dry film photoresists as permanent microstructural elements. These microstructural elements are in particular flat-ended cylindrical dry resist micropillars created at the freestanding end of the cantilever beam that can be employed as scanning probes. The resist pillars enabled imaging of a 3T3 mouse fibroblast cell culture surface to determine their elastic force constants. Alongside UV-exposure by a conventional mask aligner, we also demonstrate dry film photoresist exposure by contact-free laser lithography eliminating possible substrate damage by photomask contact.

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Section: Introductionmentioning

confidence: 99%

Facile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithography

Nilsen

Port

Roos

et al. 2019

J. Micromech. Microeng.

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show abstract

“…For instance, fabrication on the outer surface of 3D structures is possible by several means, including electron‐beam lithography, transfer method, and hydroprinting. [ 40–42 ] However, fabrication on the inner surface of the structure would be a great challenge, and to the best of our knowledge, no method has been reported to enable such fabrication. As shown in Figure 4d, the direct‐printing of nanofiber is demonstrated on the inside wall (concave surface) of a cylindrical tube (material: copper) (Movie S3, Supporting Information).…”

Section: Resultsmentioning

confidence: 99%

Direct‐Printing of Functional Nanofibers on 3D Surfaces Using Self‐Aligning Nanojet in Near‐Field Electrospinning

Shin

Choi

Kim

et al. 2020

Adv Materials Technologies

Self Cite

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This paper reports a high‐resolution, template‐free, and direct‐printing method of functional nanofiber on 3D surfaces using a self‐aligning nanojet (SA‐N) in near‐field electrospinning (NFES). In the lowest regime of NFES, the cone‐jet transition is induced by the surface current, which leads to a unique jetting configuration where the microscale Taylor cone (microcone) is formed on the surface of the spherical‐shape droplet. The microcone rapidly develops to the nanoscale jet where the tangential electric force dominates the kinematics of the charged jet. The spherical‐shape ejection boundary allows the jetting angle from 0° to ±90° in both convex and concave surfaces, enabling precise deposition of nanofiber regardless of the curvature of the 3D surfaces. Using SA‐N, precise printing of functional nanofiber is successfully demonstrated on various 3D geometries, including convex, concave, and inner surface of the 3D structure. The direct‐printing ability of nanofiber on 3D surfaces using SA‐N will be a promising strategy to utilize various functional polymers in flexible electronics, printed electronics, optics, and biomedical engineering.

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“…The approaches discussed thus far have all relied upon metasurfaces or DOEs on a flat plane commensurate with standard microfabrication technologies. Recent advances have enabled fabrication of optical and optoelectronic devices on curved surfaces, either via direct writing techniques 109 – 111 or conformal integration of flexible membranes 100 , 112 – 115 This new possibility has inspired alternative designs exploiting curved optical elements.…”

Section: Optical Metasurfaces: All Roads That Lead To Wfov Opticsmentioning

confidence: 99%

“…One integration route involves fabrication of metasurfaces on stretchable elastomer substrates followed by attachment onto curved surfaces 112 , 190 , 191 . Laser/electron-beam writing 109 – 111 and soft nanoimprint lithography 192 can be employed to directly pattern metasurface structures on curved surfaces. However, these techniques are often limited to integration on surfaces with relatively small curvature.…”

Section: Future Paths Through the Lens Of Meta-opticsmentioning

confidence: 99%

Wide field-of-view metalens: a tutorial

Shalaginov

Lin

et al. 2023

Adv. Photon.

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.Wide field-of-view (FOV) optics are essential components in many optical systems, with applications spanning imaging, display, sensing, and beam steering. Conventional refractive wide FOV optics often involve multiple stacked lenses, resulting in large size and weight as well as high cost. Metasurface lenses or metalenses promise a viable solution to realizing wide FOV optics without complex lens assembly. We review the various architectures of wide FOV metalenses, elucidate their fundamental operating principles and design trade-offs, and quantitatively evaluate and contrast their imaging performances. Emerging applications enabled by wide FOV metasurface optics are also discussed.

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Facile electron-beam lithography technique for irregular and fragile substrates

Cited by 7 publications

References 16 publications

Facile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithography

Facile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithography

Direct‐Printing of Functional Nanofibers on 3D Surfaces Using Self‐Aligning Nanojet in Near‐Field Electrospinning

Wide field-of-view metalens: a tutorial

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