2012
DOI: 10.1002/ejic.201200593
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Facile Self‐Assembly Synthesis and Characterization of Diselenophosphinato Octanuclear CuI Clusters Inscribed in a Twelve‐Vertex Selenium Polyhedron

Abstract: The self‐assembly synthesis and structural characterization of the first representatives of diselenophosphinato octanuclear CuI clusters inscribed in a twelve‐vertex selenium polyhedron are reported herein. An extremely facile (room temp., THF, 1 h) reaction between [Cu(MeCN)4](PF6) and ammonium diselenophosphinate, [NH4][Se2P(CH2CH2Ph)2] (1), in a 4:3 molar ratio resulted in the self‐assembly of copper(I) cluster [Cu8{Se2P(CH2CH2Ph)2}6](PF6)2 (2) containing an empty Cu8 cubic core. Meanwhile, when the reactan… Show more

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Cited by 30 publications
(11 citation statements)
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“…Various dithiophosphinato or diselenophosphinato complexes have been synthesized, with the general structures of M(EEPR 2 ) n , where M = metal ions of Group IIIA (trivalent), IIB (divalent), IVA (divalent), and IB (monovalent), and R = alkyl, phenyl, and alkoxy groups. [28][29][30][31][32] Some of these complexes have been used in SSPAs to make E-based binary semiconductor NCs and thin films but only at temperature higher than 300 8C. [9][10][11][12][13][14] To explore the common mechanism for the formation of the various ME semiconductor nanomaterials from the SSPA and DSPA, herein, CdSe was investigated as a model system in detail.…”
mentioning
confidence: 99%
“…Various dithiophosphinato or diselenophosphinato complexes have been synthesized, with the general structures of M(EEPR 2 ) n , where M = metal ions of Group IIIA (trivalent), IIB (divalent), IVA (divalent), and IB (monovalent), and R = alkyl, phenyl, and alkoxy groups. [28][29][30][31][32] Some of these complexes have been used in SSPAs to make E-based binary semiconductor NCs and thin films but only at temperature higher than 300 8C. [9][10][11][12][13][14] To explore the common mechanism for the formation of the various ME semiconductor nanomaterials from the SSPA and DSPA, herein, CdSe was investigated as a model system in detail.…”
mentioning
confidence: 99%
“…10 Along this line, a group of metal complexes including alkali and d-block elements passivated by a number of selenium containing ligands, namely, diselenophosphates (dsep), diselenophosphonates (dsepo), diselenophosphinates (dsepi), and triselenophosphonates (tsepo) have been established to be useful sources in metal selenide nanomaterial synthesis. 2a Discrete group 11 metals (Cu I , Ag I , and Au I ) with diselenophosph(in)ates ligands [14][15][16][17][18] are primarily studied by the Liu and O'Brien groups. 19 Anion-centered multinuclear Cu I and Ag I clusters of this kind are particularly interesting due to their intrinsic characteristics, reminiscent of guest-host supramolecules.…”
Section: Introductionmentioning
confidence: 99%
“…13 For example, by taking advantage of the labile P-Se bond, diselenophosphates-stabilized tetrahedral copper cluster [Cu 4 {Se 2 P(O i Pr) 2 } 4 ] was employed as a single source precursor for the fabrication of Cu 2-x Se nanowires with lengths of several micrometers and diameters of 30-50 nm via CVD process. 2a Discrete group 11 metals (Cu I , Ag I , and Au I ) with diselenophosph(in)ates ligands [14][15][16][17][18] are primarily studied by the Liu and O ' Brien groups. 2a Discrete group 11 metals (Cu I , Ag I , and Au I ) with diselenophosph(in)ates ligands [14][15][16][17][18] are primarily studied by the Liu and O ' Brien groups.…”
mentioning
confidence: 99%
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“…Since then, other small [Cu x ] species (x = 4-8) have been isolated and studied. [12][13][14][15][16][17][18][19][20] In some cases, [Cu x ] structures can be described in terms of sequential addition of a face-capping copper atom to a central Cu 4 -tetrahedron (Figure 1), with interatomic copper distances (d Cu-Cu ) ranging from 2.3-2.8 Å (sum of Cu-Cu van der Waals radii = 2.80 Å). 21 Tetrameric units of the form Cu 4 L 4 are found in both planar 2-dimensional arrays and 3dimensional cubanes (e.g L = N=PR 3 , R = Et, Ph, NMe 3 ).…”
mentioning
confidence: 99%