Atomic layer deposition (ALD) is gaining traction in the semiconductor industry
due to its ability to meet the demands of high aspect ratios and densities. This
is attributed to its excellent step coverage and uniformity, which are based on
the self-limiting deposition process. Its applications have expanded to include
various components such as memory device capacitors, gate oxides, metal
barriers, and charge transport channels. Moreover, ALD is being explored for
diverse purposes not only within the semiconductor field but also in displays
and optoelectronics. This review aims to explore the versatility of ALD
deposition methods, widely utilized in the semiconductor industry, and their
potential applications in the display and optoelectronics sectors. Additionally,
we present future prospects for ALD applications in display based on current
approaches.