2017
DOI: 10.1039/c7ra00768j
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Facile synthesis of self-aligned gold nanoparticles by crack templated reduction lithography

Abstract: Fabrication of 1D gold nanoparticle (NP) arrays by crack templated reduction lithography (CTRL) isdemonstrated. The gold NPs are synthesized in situ on the cracks in a polydimethoxysiloxane (PDMS) substrate without additional reducing/stabilizing agents. Upon directionally bending the substrate, various array patterns formed on the PDMS rubber.Highly aligned gold nanoparticles (NPs) and nanowires (NWs) have attracted considerable interest owing to their diverse applications in electrical 1-4 and optical sen… Show more

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Cited by 7 publications
(6 citation statements)
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“…Solution nucleation of particles leads to consumption of the gold precursor and can produce polycrystalline structures that can later deposit onto the surface, increasing polydispersity of the final products. ,,, There are many materials on which direct growth of gold and other metal nanoparticles can be directly performed. A few examples include graphene/graphene oxide, , MoS 2 , , cellulose, , silicon, polydimethylsiloxane (PDMS), polyelectrolyte multilayers, and conductive polymers polypyrrole and polyaniline …”
Section: From Colloidal Synthesis To In Situ Growthmentioning
confidence: 99%
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“…Solution nucleation of particles leads to consumption of the gold precursor and can produce polycrystalline structures that can later deposit onto the surface, increasing polydispersity of the final products. ,,, There are many materials on which direct growth of gold and other metal nanoparticles can be directly performed. A few examples include graphene/graphene oxide, , MoS 2 , , cellulose, , silicon, polydimethylsiloxane (PDMS), polyelectrolyte multilayers, and conductive polymers polypyrrole and polyaniline …”
Section: From Colloidal Synthesis To In Situ Growthmentioning
confidence: 99%
“…227,228 Directional deformation of the PDMS has been used to grow ∼100 nm particle arrays on 800 nm wide and 120 nm amplitude cracks. 227 Directional wrinkling gives a similar result, producing line arrays 400 nm wide and 30 nm deep (Figure 10C). 228 2.3.2.2.…”
Section: Patterning In Situmentioning
confidence: 99%
“…[30,59,60] In fact, using only a surfacebound strong reductant usually requires ≈5 times more gold salt and hours to days long incubation. [31,32,35] Continuing with the goal of limiting secondary nucleation, we identified factors that could lead to the undesired spontaneous formation of colloids: i) the presence of impurities in the growth solution, ii) growth rate, and iii) excess ink leeching into solution. Regarding impurities, the water source is known to play important roles in colloidal synthesis, especially for the synthesis of anisotropic particles.…”
Section: Chemical Nanopatterning With Thermal Nanoimprint Lithographymentioning
confidence: 99%
“…So far, the possibility to direct growth into tunable nanometric patterns has proven difficult to achieve via in situ growth. [31][32][33][34][35] Recent strategies for site-directed in situ gold nanoparticle growth include cracktemplated reduction lithography and similar methods. [32,35] Despite the possibility of creating single-nanoparticle-wide features using these techniques, the patterns accessible are limited to lines with resolutions of microns to hundreds of nanometers.…”
mentioning
confidence: 99%
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