“…Notably, thermal chemical-vapor deposition (CVD) is a powerful method because of its ability to produce ZnO nanostructures with high crystallinity, various morphologies, and low chemical contamination [6,7]. Several growth parameters affecting the ZnO nanostructures during thermal CVD have been widely explored, including the temperature [8], partial oxygen pressure [9], cat- * E-mail: seonglim@skku.edu † E-mail: mjeong@skku.edu alysts [10], growth time [11], and source materials [12]. However, changes in the shape of the ZnO nanostructure, i.e., the formation of nanowires, nanospears, nanowalls, and nanorods, in relation to the distance between the reactant and the substrate have not been systematically investigated yet.…”