Self-aligned double patterning scheme is the dominant technique which is widely adopted in semiconductor industry to achieve finer patterns before extreme ultraviolet (EUV) lithography volume production is available. The critical dimension (CD) for the key structures fabricated from SADP flow, normally referred to as Bitline (BL) or Wordline (WL), is crucial to enable the microcircuitry to operate properly. Therefore, the CDs' precise control receives substantial attention as a key indicator to demonstrate the manufacturing process capability in quality management. This paper presents an in-depth analysis on BL CDs' variation control from SADP scheme, followed by several applicable approaches for process capability improvement across multiple modules through conceptual and experimental illustration, which could serve as a guideline for semiconductor manufacturing industry.