Fast Atom Beam Etching of Glass Materials with Contact and Non-Contact Masks

Abstract

Fast atom beam (FAB) etching of multicomponent glass and silica glass was performed using a contact mask (electron beam resist) and two non-contact masks (typically 5-µ m-diameter particles and a copper mesh with a 5 µ m line width and 20 µ m line spacing). FAB etching of a multi component glass substrate with the micro-particle mask successfully fabricated a precisely projected, 1.0-µ m-high outline pattern on the substrate. FAB etching of a silica glass substrate with the copper-mesh mask, which was separated from the substrate by about 100 µ m, successfully produced a projected, 34-nm-high outline pattern on the substrate. A combination of electron beam lithography with FAB etching on silica glass successfully fabricated nano-scale ultrafine patterns whose aspect ratio was higher than 7 (50 nm line width and 360 nm height). In all three fabrications, the side walls and etched surfaces were very smooth and were perpendicular to each other.

Integration of an Immunosorbent Assay System: Analysis of Secretory Human Immunoglobulin A on Polystyrene Beads in a Microchip

“…The middle plate was attached to the bottom plate by using an optical contact; that is, the plates were polished to an optical smoothness and then laminated together without any adhesive in an oven at 1150 °C. A shallow channel of the dam region was fabricated by the fast atom beam fabrication method on the upper side of the laminated plates as reported previously …”

Determination of Carcinoembryonic Antigen in Human Sera by Integrated Bead-Bed Immunoasay in a Microchip for Cancer Diagnosis

“…The middle plate was attached to the bottom plate by using an optical contact, that is, the plates were polished to an optical smoothness, and then laminated together without any adhesive in an oven at 1150 °C. A shallow channel in the dam region was fabricated by the fast atom beam method on the upper side of the laminated plates as reported previously. , The depth of the shallow channel was estimated as 10 μm, and the reaction solid phase, that is, polystyrene beads (41.7 μm in diameter) would be retained in the dam region. Finally, the cover plate was laminated onto the plates as described above.…”

Microchip-based immunoassay system with branching multichannels for simultaneous determination of interferon-γ

“…A shallow channel in the weir region was fabricated by the fast atom beam method on the upper side of the laminated plates as reported previously [8,18]. The depth of the shallow channel was estimated as 10 mm, and the reaction solid phase, i.e., polystyrene beads (45 mm in diameter) would be retained in the weir region.…”