Fast optical phased array on a 300-mm silicon platform

Barrera, C.; Guerber, Sylvain; Fowler, Daivid; Monfray, S.; Montagne, A.; Myko, A.; Grosse, Philippe; Ribaud, Karen; Lemaitre, P.; Crémer, S.; Charlet, Ismael; Vivien, Laurent; Bœuf, F.

doi:10.1117/12.2582776

Cited by 5 publications

(3 citation statements)

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“…Calibration processes reported in literature employ an arrangement by which individual phase shifters are tuned according to the measurement of specific OPA parameters [23][24][25][26]. Also, the feedback signal can be provided by an additional on-chip detector to allow real-time calibration [3,12].…”

Section: Introductionmentioning

confidence: 99%

Simplified Beam Steering and Fast Error Compensation of Optical Phased Arrays by Using a Novel Weighted-Grouping Algorithm

Gayatri,

Lin,

Donati

et al. 2024

IEEE Access

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Optical phased arrays (OPAs) serve as pivotal components for non-mechanical beam steering and find relevance in various applications. However, they necessitate correction of optical phase errors within the antenna array, arising from fabrication imperfections in waveguides. We introduce a novel weighted group phase compensation (w-GPC) algorithm to simplify phase compensation and beam steering for OPAs but also enhances sidelobe suppression. A key advantage lies in its reduced hardware requirements, enabling phase compensation with only half or a quarter of the original number of electrodes. Simulation-based verification confirms that beam steering remains achievable even with the reduced number of phase shifts. Consequently, this minimizes the necessary electrodes on the OPA chip and significantly streamlines control circuitry. This feature is especially beneficial for large-scale OPAs comprising hundreds or even thousands of phase shifters. The w-GPC's phase compensation significantly outpaces traditional Genetic and PSO algorithms in computation speed. Applying the proposed algorithm with half controlled phases to optimize 64-and 1024-element OPAs yields impressive peak-to-sidelobe level (PSLL) enhancements, reaching up to 15 dB and 22 dB, respectively. Remarkably, PSLL remains over 19 dB even when only one sixteen of the phases are utilized to correct phase errors and steer the beam for a 1024-element OPA. These outcomes affirm that exceptional PSLL values can be achieved by great reduction in the number of control electrodes.

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Section: Introductionmentioning

confidence: 99%

Simplified Beam Steering and Fast Error Compensation of Optical Phased Arrays by Using a Novel Weighted-Grouping Algorithm

Gayatri,

Lin,

Donati

et al. 2024

IEEE Access

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“…But at the same time, derivative technologies are developed to serve different markets in different application fields. We can think about motion sensors, bio sensors, photonics chips [2,4] or optical devices [1,3,5].…”

Section: Introduction and Challengesmentioning

confidence: 99%

OPC flow for non-conventional layouts: specific application to optical diffusers

Sungauer

Audran²,

Guillaumet³

et al. 2022

37th European Mask and Lithography Conference

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Some specific applications, such as optical devices, require non-conventional layouts. In this context, the known OPC solutions developed during decades and optimized for CMOS planar applications are facing significant challenges. Standard design files format as well as OPC algorithms are indeed suitable for 0-45-90° edges (also called Manhattan layouts) and other angle edges can lead to bad OPC results, huge run time, large file size, and even run crashes.While innovative developments are on going from OPC suppliers' side, we have to use smartly the conventional OPC platforms to achieve accurate, fast and cost-effective solutions.Taking the example of optical diffusers application, we will discuss the implementation of such an OPC flow, including rule-based correction, SRAF insertion, model-based correction, and mask sign-off strategy.

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confidence: 99%

Etch model calibration and usage in OPC flow for curvilinear layouts

Sungauer

Depre²,

Greca³

2023

DTCO and Computational Patterning II

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The development of optical devices requires the patterning of non-conventional shapes on the wafers [1,2,3,4,5]. In addition to the specific challenges related to the treatment of these curvilinear patterns, an accurate proximity correction must be provided. The Critical Dimensions (CDs) of such patterns are indeed around 100nm, which requires the implementation of advanced lithography processes, similar to CMOS microelectronics technologies. In order to develop a production compliant and robust OPC solution, we previously demonstrated the need for etch bias modelling [1]. Taking the example of optical metasurfaces application, and using ASML’s Tachyon OPC+ platform, we will present the implementation of an OPC flow suitable for curvilinear patterns, starting from the metrology strategy. We will then discuss the etch model calibration methodology, model-based etch bias correction implementation in OPC, and global OPC performance.

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Fast optical phased array on a 300-mm silicon platform

Cited by 5 publications

References 0 publications

Simplified Beam Steering and Fast Error Compensation of Optical Phased Arrays by Using a Novel Weighted-Grouping Algorithm

Simplified Beam Steering and Fast Error Compensation of Optical Phased Arrays by Using a Novel Weighted-Grouping Algorithm

OPC flow for non-conventional layouts: specific application to optical diffusers

Etch model calibration and usage in OPC flow for curvilinear layouts

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