“…Gallium oxide (Ga 2 O 3 ), a 4.9–5.2 eV wide-band-gap semiconductor with large near band edge absorption coefficient, high thermodynamic stability, and great chemical stability, is considered to be one of the mainstream materials for fabricating SBUV detectors. – Recently, a variety of methods used to grow Ga 2 O 3 materials have been developed, such as MOCVD, PLD, and magnetron sputtering. – However, these methods require strict processes and costly equipment, which has prevented the large-scale manufacturing and application of Ga 2 O 3 SBUV photodetectors. Of course, the solution-processed films have been widely applied to the preparation of photosensitive layers in Ga 2 O 3 SBUV detectors due to the simple process, low cost, and large-area growth, but most reported SBUV detectors based on this kind of films tend to exhibit low photoresponsivity and slow response. – Regarding this situation, it has been confirmed that some unintentional doping defects, such as oxygen vacancies, carbon (C) impurities, hydrogen (H) impurities, etc., are easily formed in the solution-processed Ga 2 O 3 films due to the extremely low formation energy. – These impurity defects that are prone to becoming carrier capture centers will be important factors attenuating the photoresponsivity and response speed. Therefore, decreasing the formation of unintentional impurity defects in Ga 2 O 3 films can be the key point to fabricate a SBUV detector with high photoresponsivity and high response speed.…”