Feasibility study of printing sub-100-nm with ArF lithography

Kim, Seok-Kyun; Hong, Jong-Gyun; Park, Joo-On; Yoo, Tea-Jun; Hyun, Yoonsuk; Bok, Cheol-Kyu; Shin, Ki-Soo

doi:10.1117/12.435721

Cited by 2 publications

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“…The total depths of focus from the process windows are within the reasonable range. 6 Specifically, the DOF is 0.29 µm, 0.50 µm, 0.31 µm, and 0.76 µm for Figures 9, 10, 11, and 12, respectively. Therefore, the DOF of dense line can be improved and the IDB can be reduced by using annular OAI method.…”

Section: The Process Windowsmentioning

confidence: 99%

Application of exposure simulation system to reduce isolated-dense bias by using annular off-axis illumination

Shih

Chen

2008

SPIE Proceedings

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The optical proximity effect (OPE) is one of the most serious problems, as the optical lithography is pushed into the smaller feature size below the exposure wavelength. Some of the typical ways to solve this problem are to use the optical proximity correction (OPC) and the phase shift mask (PSM). However, these sophisticated techniques increase the cost of making masks, as well as the risk of getting defects on the masks. In this study we optimize the annular off-axis illumination (OAI) conditions to reduce the Isolated-Dense bias (IDB), in order to improve the resolution and the depth of focus (DOF) as a solution to fight for OPE. Through the simulation done with AIMS Fab 248 exposure system, the energy distribution on the photo-resist is analyzed with the intensity distribution across the simulated exposure images. The optimization is performed with the aid of Taguchi method. On the basis of the simulation analysis, the optimum optical parameters (the numerical aperture NA, the degree of coherence Sigma, and the ratio of the inner and the outer radii of the rings Annular) are selected to obtain the high resolution and enough DOF to reduce IDB value. The low IDB can be realized by using optimal optical parameters before exposure processes, without using sophisticated OPC and PSM on the masks.

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Section: The Process Windowsmentioning

confidence: 99%

Application of exposure simulation system to reduce isolated-dense bias by using annular off-axis illumination

Shih

Chen

2008

SPIE Proceedings

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“…For synchronous high-speed low-latency performance data acquisition system, need to meet the following requirements: (1) Each processor on the data acquisition cards can do data acquisition parallel. (2) With efficient data bus protocol so it can sent the all data which acquire from each data acquisition card to the main control card within a given time. (3) Data transmission delay be controlled at the nanoseconds accuracy.…”

Section: Introductionmentioning

confidence: 99%

VME Bus-Based Multiprocessor Parallel Data Acquisition System

Zhou

Chen

2013

AMR

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Synchronization data acquistition system with multiple processors is the trend of the modern manufacturing equipment development. Complex high-precision equipment even has hundreds of sensors and they are acquiring data at the same time, the sensors are distributed in dozens of data acquisition cards. The key technology is the acquisition system enable to synchro-gather data from data acquisition cards which base on data bus between them and then sent the gather data to arithmetic system. In order to synchronic data integration, it is required a high-speed and low-latency data channels and a suitable data protocol between data acquisition cards and main control card. This paper introduce a new type of synchronous data acquisition system, through the self-defined data bus and a specific memory allocation mechanism, the data acquisition system can sent the integrate data to arithmetic system through main control card after it get the data from acquisition cards, the transfer delay of data exchange is nanoseconds.

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Feasibility study of printing sub-100-nm with ArF lithography

Cited by 2 publications

References 0 publications

Application of exposure simulation system to reduce isolated-dense bias by using annular off-axis illumination

Application of exposure simulation system to reduce isolated-dense bias by using annular off-axis illumination

VME Bus-Based Multiprocessor Parallel Data Acquisition System

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