2022
DOI: 10.22226/2410-3535-2022-1-15-20
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Features of obtaining tantalum-containing coatings by magnetron sputtering

Abstract: Tantalum-containing coatings deposited on titanium in vacuum were studied. For deposition of films, a DC magnetron with a balanced magnetic system was used. High purity (99.99 %) tantalum sheet was used as a target. The current density of the glow discharge during the etching of the target was 20.4 A / m 2 . Plasma-forming gases were argon or a mixture of argon and oxygen. Three types of coatings of tantalum on titanium were obtained: the first one was tantalum oxide on titanium, the secondtantalum on titanium… Show more

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