Features of the Influence of the Arrangement of Parts in the Chamber of Installation During Vacuum Arc Deposition on the Properties of Coatings

Abstract

The effect of the spatial arrangement in the physical vapor deposition (PVD) chamber on the composition and properties of coatings is considered using the example of the deposition of the (Ti,Al)N coating. The proposed method is one of the ways (along with varying the arc current of the cathodes and the bias voltage, as well as using alloy cathodes) to change the ratio of elements in the coating, and achieves this across a wide range of values. The three samples were located, respectively, opposite the evaporator with a titanium cathode, opposite the evaporator with an aluminum cathode and in an intermediate position between the two evaporators. The coating was deposited without rotating the turntable. The aluminum content in the coatings decreases from 94.2 at.% for the sample located directly opposite the evaporator with an Al cathode to 10.3 at.% for the sample located opposite the evaporator with a Ti cathode. In the coating deposited on the sample located opposite the aluminum cathode, the formation of a nitrided layer with a thickness of about 250 nm was observed in the substrate. The maximum hardness (32.3 ± 1.7 GPa) belongs to a coating on the sample occupying an intermediate position. The coating on the sample located opposite the aluminum cathode has a hardness of 16.7 ± 0.8 GPa. The coating hardness on the sample located opposite the titanium cathode is 28.5 ± 1.1 GPa. The best fracture strength in the scratch test was observed for the coating on the sample occupying an intermediate position. The nature of the coating fracture in the scratch test was studied. A sufficiently high-quality coating can be obtained without rotating the turntable, and the coating composition can be controlled by changing the position of the sample relative to the evaporators.