2019
DOI: 10.1063/1674-0068/cjcp1903044
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Femtosecond time-resolved spectroscopic photoemission electron microscopy for probing ultrafast carrier dynamics in heterojunctions

Abstract: The fast developing semiconductor industry is pushing to shrink and speed up transistors. This trend requires us to understand carrier dynamics in semiconductor heterojunctions with both high spatial and temporal resolutions. Recently, we have successfully set up a time-resolved photoemission electron microscopy (TR-PEEM), which integrates the spectroscopic technique to measure electron densities at specific energy levels in space. This instrument provides us an unprecedented access to the evolution of electro… Show more

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Cited by 5 publications
(4 citation statements)
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“…Photoemission electron microscopy (PEEM) was conducted at the XPPEM end station of beamline 09 U (Dreamline) in the Shanghai Synchrotron Radiation Facility (SSRF), which is equipped for spectroscopic photoemission and low energy electron microscopy (SPELEEM-III, Elmitec GmbH) . A 10 × 10 × 1 mm 3 sample of Cu 2 Ge 11 Sb 2 Te 15 was measured in an ultrahigh vacuum (UHV) chamber with a base pressure of ∼1 × 10 –10 Torr.…”
Section: Methodsmentioning
confidence: 99%
See 2 more Smart Citations
“…Photoemission electron microscopy (PEEM) was conducted at the XPPEM end station of beamline 09 U (Dreamline) in the Shanghai Synchrotron Radiation Facility (SSRF), which is equipped for spectroscopic photoemission and low energy electron microscopy (SPELEEM-III, Elmitec GmbH) . A 10 × 10 × 1 mm 3 sample of Cu 2 Ge 11 Sb 2 Te 15 was measured in an ultrahigh vacuum (UHV) chamber with a base pressure of ∼1 × 10 –10 Torr.…”
Section: Methodsmentioning
confidence: 99%
“…photoemission and low energy electron microscopy (SPELEEM-III, Elmitec GmbH). 81 A 10 × 10 × 1 mm 3 sample of Cu 2 Ge 11 Sb 2 Te 15 was measured in an ultrahigh vacuum (UHV) chamber with a base pressure of ∼1 × 10 −10 Torr. The sample was heated by the radiation from a tungsten filament underneath, and the temperature was increased by 2−3 K/min.…”
Section: Chemistry Of Materialsmentioning
confidence: 99%
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“…At NSLS II (Reininger et al, 2012), which hosts a similar instrument, the main difference is the spot size (50 mm) and grazing incidence illumination. At Shanghai Synchrotron Radiation Facility (Xue et al, 2014), an aberration-corrected photoemission electron microscope (AC-PEEM) is used for time-resolved photoelectron microscopy (Li et al, 2019). There are also two non-commercial aberration-corrected PEEM instruments: one is SMART type at BESSY II [a complete version with LEEM function and a dedicated Omega-type energy filter (Schmidt et al, 1998)] and the other one is PEEM3 at the Advanced Light Source (beamline 11.0.1.1).…”
Section: Introductionmentioning
confidence: 99%