“…The injector consists of a computer-driven, high-speed, precision electromagnetic valve operating under a repetitive pulsing regime. The deposition conditions were optimized in order to obtain a pure and high quality PTO perovskite phase (bulk lattice parameters a = 3.899Å and c = 4.153Å) deposited on an LAO substrate (a = 3.791Å, supplied by CrysTec GmbH, Berlin, Germany) with the surface cut parallel to a (00l) plane (indices refer to the pseudo-cubic setting) [35], [36]. Films of different thickness from 30 to 460 nm were deposited at 650 • C. The thicknesses were measured from the film cross-section micrographs obtained by scanning electron microscopy (SEM).…”