tacting solutions, what, for example, is of relevance for the protection of materials from oxidation and degradation. Even more important, this assembly can modify or even redefine completely the chemical, physical, and biological properties of the substrate surface, adapting it to a specific task or an application. Finally, such a supported assembly can be functional on its own, for example, as an element of molecular or organic electronics [4][5][6][7] or a molecular sensor array. [8] A particular advantage of SAMs is the flexibility of their design. The SAMforming molecules consist generally of three major building blocks, videlicet the docking group mentioned above, the terminal tail group building the SAM-ambient interface, and the molecular backbone connecting the docking and tail groups and mediating the self-assembly. [1][2][3] Depending on a particular goal or a specific application, these buildings blocks can be flexibly selected and combined together as well as individually designed, for example, by the introduction of functional groups into the molecular backbone. [9,10] The resulting SAMs can be further modified by physical tools, such as ultra-violet light, electron irradiation, X-rays, and ions. Among these tools, electron irradiation is probably the most versatile one, as it gives the largest flexibility and provides the highest possible lateral resolution. It serves in particular well for tuning SAM properties, [11] fixation of metal films at the SAMambient interface, [12,13] SAM-based lithography and related nanofabrication, [14][15][16][17][18][19][20][21][22][23] as well as preparation of SAM-based carbon nanomembranes (CNMs). [24][25][26][27][28] All these applications rely on the specific effects of electron irradiation on the SAM-forming molecules and the SAMs as a whole. The major irradiationinduced processes include cleavage of individual chemical bonds within the SAM-forming molecules or between the docking groups and the substrate, desorption of the released molecules and their fragments, formation of new chemical groups as a result of reactions between electron-activated moieties, and cross-linking of the molecular fragments. [29][30][31] The occurrence, extent, and rates of the above processes as well as the balance between them depend on the electron energy, identity of the substrate, length of the molecular backbone, and packing density of a SAM but, above all, on the character of the molecular backbone. [31][32][33][34][35] Whereas the scission of nearly all bonds (CH, CC, Self-assembled monolayers (SAMs) can serve as versatile resist/template materials for surface engineering and electron beam lithography (EBL), making possible a new type of lateral patterning: chemical lithography (CL). Whereas CL has been well established for aromatic SAMs, it is hardly possible for aliphatic monolayers, because of extensive irradiation-induced damage excluding selective modification of specific chemical groups. Turning this drawback into an advantage, the irradiation-promoted exchange reactio...