Ferromagnetic enhanced inductive plasma sources

Godyak, Valery

doi:10.1088/0022-3727/46/28/283001

Cited by 75 publications

(46 citation statements)

References 48 publications

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“…3,5 Five different RF coupling modes can be considered for an electronegative ion thruster: capacitively-coupled plasmas (CCP), very high frequency CCPs (VHCCP), inductively-coupled plasmas (ICP), ferromagnetic enhanced ICPs (FMICP), and helicon mode plasmas. 9 Each RF coupling mode is distinguished by the ionization physics and the RF power required to achieve each mode. Since ICPs and FMICPs offer the most even radial distribution of ion density as compared to the other coupling modes, 10,11 they are the most desirable mode for gridded ion thruster operation.…”

Section: A Plasma Source Considerationsmentioning

confidence: 99%

“…FMICPs are more easily matched to an RF source and, when properly designed, can operate more efficiently and with greater cost effectiveness over a wide range of RF power and gas pressure conditions when compared with standard ICPs. 9 For the MINT source design, a ferrite toroid is used in conjunction with a wide, single-turn, copper antenna similar in design to a plasma processing antenna. 9 The permeability of the ferrite toroid limits operation to radio frequencies less than 4 MHz to gain the benefits of the ferrite core.…”

Section: A Plasma Source Considerationsmentioning

confidence: 99%

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Design and Preliminary Testing Plan of Electronegative Ion Thruster

Schloeder¹,

Liu²,

Walker³

et al. 2014

50th AIAA/ASME/SAE/ASEE Joint Propulsion Conference

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Electronegative ion thrusters are a new iteration of existing gridded ion thruster technology differentiated by their ability to produce and accelerate both positive and negative ions. The primary motivations for electronegative ion thruster development include the elimination of lifetime-limiting cathodes from a thruster system and the ability to generate appreciable thrust through the acceleration of both positive and negative ions. Proof-of-concept testing of the PEGASES (Plasma Propulsion with Electronegative GASES) thruster demonstrated the production of positively and negatively-charged ions (argon and sulfer hexafluoride, respectively) in an RF discharge and the subsequent acceleration of each charge specie through the application of a time-varying electric field on a pair of metallic grids similar to those found in gridded ion thrusters. Leveraging the knowledge gained through experiments with the PEGASES I and II prototypes, the MINT (Marshall's Ion-ioN Thruster) is being developed toprovide a platform for additional electronegative thruster proof-of-concept validation testing including direct thrust measurements. The design criteria used in designing the MINT are outlined and the planned tests used to characterize the performance of the prototype are described.

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Section: A Plasma Source Considerationsmentioning

confidence: 99%

Section: A Plasma Source Considerationsmentioning

confidence: 99%

Design and Preliminary Testing Plan of Electronegative Ion Thruster

Schloeder¹,

Liu²,

Walker³

et al. 2014

50th AIAA/ASME/SAE/ASEE Joint Propulsion Conference

View full text Add to dashboard Cite

show abstract

“…However, the principle of ICP generation has a few limitations that significantly complicate the scaling up of ICP sources for large-scale plasma processing systems (for example, for the future 450 mm wafers technology) [1]. ICP has a weak magnetic coupling between the ICP coil and plasma (k≈0.2-0.7), a low power factor of the coil (cosφ<1) respectively, therefore the use of a resonant-matching network is necessary to improve the ICP power transfer efficiency, leading to high current and high voltage in the coil.…”

Section: Introductionmentioning

confidence: 99%

“…These limitations of RF ICP can be overcome with the enhancement of the magnetic coupling between the ICP coil and plasma by a closed ferromagnetic core [1]. In this case, the magnetic flux is concentrated almost in the ferromagnetic core, therefore magnetic coupling and power factor of the coil are high, leading to the increase in the ICP power transfer efficiency.…”

Section: Introductionmentioning

confidence: 99%

“…As the magnetic permeability of the core is high, the driving frequency can be significantly decreased, to a few kilohertz, thereby the standing wave effect is also eliminated. As a result, new devices for large-scale plasma processing can be developed on the basis of the lowpressure low-frequency inductively coupled plasma sources enhanced with ferromagnetic cores [1]. It is necessary to underline that existing models of RF ICP cannot be used for the low-frequency ICP with a ferromagnetic core due to a principal difference in discharge configuration: in the lowfrequency ICP with a ferromagnetic core, the discharge current is directed axially to the discharge chamber while in RF ICP -azimuthally.…”

Section: Introductionmentioning

confidence: 99%

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Low-pressure low-frequency inductive discharge with ferrite cores for large-scale plasma processing

Isupov

Fedoseev

Sukhinin

et al. 2017

J. Phys.: Conf. Ser.

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Abstract. Electrophysical characteristics of a low-frequency (100 kHz) low-pressure (10-100 Pa) argon inductive discharge with ferrite cores have been investigated for discharge currents of 1-50 A, discharge chamber diameter of 230 mm. The dependencies of electric field strength on the argon pressure and discharge current were measured. Radial profiles of electron density and temperature were determined with double electric probes. Experimental results were compared with numerical results obtained by a self-consistent kinetic model of the lowfrequency ICP, based on the simultaneous solution of a non-local Boltzmann equation for electron energy distribution function and balance equations for the metastable argon atoms density and gas temperature. Comparison of numerical and experimental results is presented.

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Characteristics of a dual‐radio‐frequency cylindrical inductively coupled plasma

Hua

Song

Hao

et al. 2019

Contributions to Plasma Physics

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The plasma parameters such as electron density, effective electron temperature, plasma potential, and uniformity are investigated in a new dual-frequency cylindrical inductively coupled plasma (ICP) source operating at two frequencies (2 and 13.56 MHz) and two antennas (a two-turn high-frequency antenna and a six-turn low-frequency (LF) antenna). It is found that the electron density increases with 2 MHz power, whereas the electron temperature and plasma potential decrease with 2 MHz power at a fixed 13.56 MHz power. Moreover, the plasma uniformity can be improved by adjusting the LF power. These results indicate that a dual-frequency synergistic discharge in a cylindrical ICP can produce a high-density, low-potential, low-effective-electron-temperature, and uniform plasma. KEYWORDScylindrical inductively coupled plasma source, dual-frequency discharge INTRODUCTIONPlasma source development has been one of the major research activities in the low-temperature plasma community because of the increasingly challenging demands for plasma processing. [1][2][3] Various plasma sources, e.g. inductively coupled plasma (ICP) sources, [4][5][6][7] capacitively coupled plasma (CCP) sources, [8,9] electron cyclotron resonance (ECR) sources, [10] and microwave plasma sources, [11] are being extensively investigated by many researchers. Among these plasma sources, ICP sources as a potential candidate for large-area fabrication have attracted a great amount of attention because of their desirable advantages such as a relatively higher plasma density, low electron temperature, low operating gas pressure, and reduced ion damage to the substrate, as well as the possibility of independent control of ion energies and ion fluxes by using a dual-frequency (DF) discharge. [4][5][6][7]12] During plasma processing, desirable plasma characteristics, such as a high plasma density, low electron temperature and plasma potential, and good plasma uniformity are of great importance. Typical examples arise in the etching and deposition processes of semiconductor manufacturing, in which a high plasma density is helpful for achieving high processing rates and production throughput of active particles, whereas a lower electron temperature and plasma potential can avoid electrical and physical damage to the substrate. [13] Moreover, the wafer quality depends critically on plasma uniformity.In order to optimize the plasma characteristics of an ICP source, various methods including changing the antenna shape, [14,15] employing multiple low-inductance antennas, [16] enhancing the discharge by a ferromagnetic core , [3,17,18] and using a DF dual-antenna discharge [6,7,13,[19][20][21] have been proposed. Among these methods, DF technology appears particularly promising. About a decade ago, DF discharge technology operating with two power supplies of differing frequencies began to be used in CCP sources for etching dielectric thin films. The high-frequency (HF) source tends to have more influence on the plasma density and hence ion flux to the electrode, wh...

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Ferromagnetic enhanced inductive plasma sources

Cited by 75 publications

References 48 publications

Design and Preliminary Testing Plan of Electronegative Ion Thruster

Design and Preliminary Testing Plan of Electronegative Ion Thruster

Low-pressure low-frequency inductive discharge with ferrite cores for large-scale plasma processing

Characteristics of a dual‐radio‐frequency cylindrical inductively coupled plasma

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