2016
DOI: 10.1088/0022-3727/49/26/265001
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Ferromagnetic resonance in thin films submitted to multiaxial stress state: application of the uniaxial equivalent stress concept and experimental validation

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Cited by 19 publications
(23 citation statements)
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“…One Kpt//film sample from each batch was characterised with an FMR-under-stress setup. 21,22 To enable this, the sample was glued to a piezoelectric actuator and a dc voltage was applied to the actuator to strain the sample. The second film of each batch was used to take measurements of the FMR response first in the presence of pure nitrogen gas (N 2 ) and then in the presence of pure hydrogen gas.…”
Section: Methodsmentioning
confidence: 99%
“…One Kpt//film sample from each batch was characterised with an FMR-under-stress setup. 21,22 To enable this, the sample was glued to a piezoelectric actuator and a dc voltage was applied to the actuator to strain the sample. The second film of each batch was used to take measurements of the FMR response first in the presence of pure nitrogen gas (N 2 ) and then in the presence of pure hydrogen gas.…”
Section: Methodsmentioning
confidence: 99%
“…Finally, the relation between strains and voltage is given by data on Figure b. In these conditions, the resonance field for a magnetic field applied along x ‐axis is given by centerHnormalrnormalenormals=true(2πMnormalS+3λMnormalSσyytrue)2+true(2πfγtrue)2center2πMs3λMs(2σnormalxnormalxσnormalynormaly) where γ is the gyromagnetic factor. We have carried out standardized FMR measurements in absence of applied voltage (not shown here) on the “Continuous Film” system to determine M S = 950 emu cm −3 and γ = 1.822 × 10 7 Hz Oe −1 values.…”
Section: Strains Transmission Factors αXx and αYy For The Different Smentioning
confidence: 99%
“…Finally, the relation between strains and voltage is given by data on Figure 1b. In these conditions, the resonance field for a magnetic field applied along x-axis is given by [34] H res ¼ ffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffi ffi…”
mentioning
confidence: 99%
“…The third and fourth terms represent the OOP uniaxial anisotropy energy characterized by a constant K u and the magnetocrystalline anisotropy energies F MAE characterized by constants K i ( i = 1,2,3…), respectively. The last term is the magnetoelastic energy, which is discussed by the orthogonal normal stresses model(see more details in the Supporting Information). In this study, the T‐LFO films are fully relaxed so that the F MAE can be ignored.…”
mentioning
confidence: 99%