Field Around the Focal Region of a Paraboloidal Reflector Placed in Isotropic Chiral Medium

Rahim, Tariq; Mughal, Muhammad Junaid; Naqvi, Qaisar Abbas; Faryad, Muhammad

doi:10.2528/pierb09031002

Cited by 22 publications

(26 citation statements)

References 28 publications

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“…The present work is an extension of previous work, in which field around the caustic of a parabolic reflector placed in medium with high chirality parameter was analyzed, to three dimensional case in which field around the focus of a paraboloidal reflector placed in a chiral medium supporting NPV and PPV is analyzed [24]. The GO solution for this geometry using Maslov's method has been derived previously in [13]. Analysis of the previously derived expressions is extended to study the field behavior with the increase in the chirality parameter of the medium.…”

Section: Introductionmentioning

confidence: 89%

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Paraboloidal Reflector in Chiral Medium Supporting Simultaneously Positive Phase Velocity and Negative Phase Velocity

Rahim¹,

Mughal²,

Naqvi³

et al. 2009

PIER

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Abstract-Focused high frequency electromagnetic waves reflected from a PEC paraboloidal surface placed in homogeneous, reciprocal and isotropic medium with high chirality parameter are analyzed. The value of the chirality parameter is set such that it simultaneously supports modes of negative and positive phase velocities. Present work is an extension of the previous work, in which the chiral medium supports only positive phase velocity. Using the previous derived expressions, line plots in the focal region are obtained.

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Section: Introductionmentioning

confidence: 89%

“…Geometrical Optics (GO) and Maslov's method are applied to analyze the field near the caustics of the focusing systems by many authors [13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28]. In this work paraboloidal reflector is placed in a medium having strong electromagnetic coupling.…”

Section: Introductionmentioning

confidence: 99%

Paraboloidal Reflector in Chiral Medium Supporting Simultaneously Positive Phase Velocity and Negative Phase Velocity

Rahim¹,

Mughal²,

Naqvi³

et al. 2009

PIER

Self Cite

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“…GO and Maslov's method has been utilized by many authors to study different focusing systems in the caustic region [10][11][12][13][14][15][16][17][18][19]. Focusing system in this problem is the hyperbolic lens which is placed inside a chiral medium.…”

Section: (T)/d(0) Where D(t) = ∂(Xz) ∂(ξζ)mentioning

confidence: 99%

Analysis of the Field Focused by Hyperbolic Lens Embedded in Chiral Medium

Kayani¹,

Mehmood²,

Mughal³

et al. 2011

PIER M

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Abstract-This paper is a theoretical investigation and analysis of the focal region fields of a hyperbolic focusing lens embedded in chiral medium. Chiral-dielectric and dielectric-chiral interfaces are studied and the behavior of waves after passing through these interfaces are discussed. Geometric optics (GO) is used initially. However, it fails around the focal region because it gives non-realistic singularity in this region. So, Maslov's method is used in the caustic region and the field analysis is made. The effect of chirality variation on the amplitude of the fields around the focal region is given and discussed.

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“…Applying the electromagnetic field diffraction operation [7,13], one obtains the following expressions for the fields which incident on the Entrance Pupil (EP) in the Fresnel region of the diffracted field [14,15]:…”

Section: Vector Hopkins Formulamentioning

confidence: 99%

Vector Hopkins Model Research Based on Off-Axis Illumination in Nanoscale Lithography

Cao¹,

Cheng²,

Zhang

2009

PIER

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Abstract-Based on vector electromagnetic theory and the Waveguide Model, the vector Hopkins model is deduced. The model contains the vector Hopkins formula and the resist profile model of fast Optical Proximity Correction. The vector Hopkins formula considers incidence angles and azimuth angles of off-axis illumination, which differs from the traditional scalar Hopkins formula. The resist profile model is employed to analyze the effect of the photoresist diffusion under off-axis illumination by using self-adaptive Gaussian filter with scale adjustable, and a new transmission cross coefficient is obtained. The projection system parameters are introduced simultaneously, such as incidence angles, azimuth angles of off-axis illumination and diffusion parameters of photoresist. By simulating the aerial image of 3D mask in the actual lithography process, the optimal angular range of oblique incidence is studied; the image quality by impact with the oblique incidence angle is discussed as well.

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Field Around the Focal Region of a Paraboloidal Reflector Placed in Isotropic Chiral Medium

Cited by 22 publications

References 28 publications

Paraboloidal Reflector in Chiral Medium Supporting Simultaneously Positive Phase Velocity and Negative Phase Velocity

Paraboloidal Reflector in Chiral Medium Supporting Simultaneously Positive Phase Velocity and Negative Phase Velocity

Analysis of the Field Focused by Hyperbolic Lens Embedded in Chiral Medium

Vector Hopkins Model Research Based on Off-Axis Illumination in Nanoscale Lithography

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