2007
DOI: 10.1016/j.vacuum.2006.10.002
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Field emission characteristics of CuO nanowires by hydrogen plasma treatment

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Cited by 34 publications
(12 citation statements)
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“…It might be possible to further improve the emission characteristics for industrial applications. Sung et al [14] found that hydrogen plasma treatment of CuO nanowire could enhance the field emission characteristics of the CuO nanowires showing a decrease in turn-on voltage as well as an increase in field enhancement factor. Juan et al [15] also reported that the field emission ability could be improved by simply illuminating CuO nanowires with ultraviolet light.…”
Section: Introductionmentioning
confidence: 99%
“…It might be possible to further improve the emission characteristics for industrial applications. Sung et al [14] found that hydrogen plasma treatment of CuO nanowire could enhance the field emission characteristics of the CuO nanowires showing a decrease in turn-on voltage as well as an increase in field enhancement factor. Juan et al [15] also reported that the field emission ability could be improved by simply illuminating CuO nanowires with ultraviolet light.…”
Section: Introductionmentioning
confidence: 99%
“…With regard to its commercial value and interesting properties, CuO has also been widely exploited in a versatile range of applications such as catalysts [11], magnetic storage media [12], field emission devices [13], gas sensors [14], lithium batteries [15] and solar cells [16].…”
Section: Introductionmentioning
confidence: 99%
“…Field emitters based on 1-D materials, such as ZnO, TiO 2 , Ga 2 O 3 , In 2 O 3 , and CuO NWs have been demonstrated. [3][4][5][6][7] CuO, which has a narrow bandgap of 1.2 eV, is a natural p-type material with a monoclinic structure, which makes it useful in many applications such as hightemperature superconductors, catalysis, and gas sensors. There are various methods for synthesizing CuO nanostructures, such as microwave-assisted hydrothermal methods and catalysis methods.…”
Section: Introductionmentioning
confidence: 99%