Field emission characteristics of microcrystalline diamond films: Effect of surface coverage and thickness

Arora, Shelly

doi:10.1016/j.tsf.2006.08.002

Cited by 12 publications

(5 citation statements)

References 25 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The field at which an emission current density of 0.92 mA cm À2 is achieved is considered a figure of merit for conventional flat panel displays, as well as for a continuous diamond film (0.13 mA cm À2 at 98 V mm À1 ). The value for the present system is less than 90 V mm À1 , which is better than previously reported values for various field emitting materials including microdiamond films (Arora & Vankar, 2006), but worse than those of oriented nano-, submicro-and microdiamond films. For these films, Wang et al (2002) noticed higher current densities of 780, 300 and 180 mA cm À2 for applied voltages of 1.5, 10 and 25 V mm À1 , respectively.…”

Section: Resultscontrasting

confidence: 68%

Diamond plates on dome-like particles: preparation, characterization and field emission properties

et al. 2010

View full text Add to dashboard Cite

Thin diamond microplates have been grown on dome‐like/hemispherical carbon particles on titanium carbide by a microwave plasma chemical vapour deposition (MPCVD) method using a gas mixture of methane and hydrogen. The diamond microplates have a thickness of about 200 nm. A thin (300 nm) film of titanium carbide was formed during carburization of sputtered titanium on an Si(100) substrate in MPCVD. The hemispherical carbon particles were covered with diamond microplates. The diamond microplates are isolated electron‐emitting spherules and exhibit a low threshold (50 V µm−1) and high current density (0.92 mA cm−2) in their field emission properties. A possible mechanism for the formation of the diamond microplates and hemispherical carbon particles is presented.

show abstract

Section: Resultscontrasting

confidence: 68%

Diamond plates on dome-like particles: preparation, characterization and field emission properties

et al. 2010

View full text Add to dashboard Cite

show abstract

“…This value is better than previously reported values for various field-emitting materials including microdiamond films, but worse than that of oriented nanodiamond, submicrodiamond, and microdiamond film. 5,42,43 The SEM image in Fig. 6͑a͒ and 6͑b͒ shows the well-faceted microdiamond films ͑thickness: ϳ2 m͒ have been deposited on the Si surface.…”

Section: Resultsmentioning

confidence: 99%

Growth, microstructure, and field-emission properties of synthesized diamond film on adamantane-coated silicon substrate by microwave plasma chemical vapor deposition

Tiwari

Chang

2010

Journal of Applied Physics

View full text Add to dashboard Cite

show abstract

“…Diamond films possess many excellent physical and chemical properties [1][2][3] and have been the focus of intensive research since the successful synthesis of diamond by lowpressure and low-temperature chemical vapor deposition (CVD). 4) The negative electron affinity (NEA) 5) of diamond films observed for a reconstructed (100) surface renders these films of great potential for applications as electron field emitters.…”

Section: Introductionmentioning

confidence: 99%

Growth of Microcrystalline Diamond Films on Textured Si Substrates to Enhance the Electron Field Emission Properties

Shih¹,

Huang²,

Chen

et al. 2012

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

In this study, we grew a microcrystalline diamond film on a textured Si substrate (MCD/textured Si) and demonstrated the improved electron field emission (EFE) properties of the film. We used a simple wet chemical etching method to fabricate the textured Si substrate and then grew the MCD film by microwave plasma enhanced chemical vapor deposition. Although the Raman spectroscopy profile of the MCD film was essentially unchanged, the surface morphology of the MCD film was altered markedly owing to the utilization of the textured substrate as a template. Hillocks of nanodiamond aggregates, rather than large grain granular structures, were formed for the MCD/textured Si films. The turn-on field for the EFE of the MCD/textured Si film was as small as 3.2 V/µm, with a current density as large as 751 µA/cm2 (at an applied field of 8.8 V/µm). The enhanced EFE properties of the thus-obtained MCD/textured Si film, along with the simplicity and cost-effectivity of the substrate texturing process, renders the MCD/textured Si film a good candidate for application as an electron field emitter.

show abstract

Field emission characteristics of microcrystalline diamond films: Effect of surface coverage and thickness

Cited by 12 publications

References 25 publications

Diamond plates on dome-like particles: preparation, characterization and field emission properties

Diamond plates on dome-like particles: preparation, characterization and field emission properties

Growth, microstructure, and field-emission properties of synthesized diamond film on adamantane-coated silicon substrate by microwave plasma chemical vapor deposition

Growth of Microcrystalline Diamond Films on Textured Si Substrates to Enhance the Electron Field Emission Properties

Contact Info

Product

Resources

About