Film stacking architecture for immersion lithography process

Goto, Takuo; Sanada, Masakazu; Miyagi, Tadashi; Shigemori, Kazuhito; Kanaoka, Masashi; Yasuda, Shuichi; Tamada, Osamu; Asai, Masaya

doi:10.1117/12.772411

Cited by 3 publications

(2 citation statements)

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“…In this study, film edge position is defined as the distance from the wafer apex bottom to the film edge. There are several factors that control film edge position in the bevel rinse system [1]. In this case, we focus on the wafer spin rpm during dispense of bevel rinse.…”

Section: Bevel Rinse System Performancementioning

confidence: 99%

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Backside EBR process performance with various wafer properties

Goto¹,

Shigemori²,

Vangheluwe

et al. 2009

Advances in Resist Materials and Processing Technology XXVI

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In immersion lithography process, film stacking architecture will be necessary to avoid top coat film peeling. To achieve suitable stacking architecture for immersion lithography process, an EBR process that delivers tightly controlled film edge position and good uniformity around the wafer circumference is needed. We demonstrated a new bevel rinse system on a SOKUDO RF3 coat-and-develop track for immersion lithography. The performance of the new bevel rinse system for various wafer properties was evaluated. It was found that the bevel rinse system has a good controllability of film edge position and good uniformity around the wafer circumference. The results indicate that the bevel rinse system has a large margin for wafer centering accuracy, back side particles, wafer shape and substrates with good film edge position controllability, uniformity and clean apex. The system has been demonstrated to provide a suitable film stacking architecture for immersion lithography mass production process.

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Section: Bevel Rinse System Performancementioning

confidence: 99%

“…In a previous study [1], we reported on the effective film stacking architecture with maximum lithographic area for an immersion lithography process using SOKUDO's bevel rinse system. We reported edge exclusion width was controlled on the bevel / edge with some specific coating recipe factors of the bevel rinse process.…”

Section: Introductionmentioning

confidence: 99%